公开(公告)号：US20160009562A1

公开(公告)日：2016-01-14

申请号：US14657886

申请日：2015-03-13

Applicant: EMPIRE TECHNOLOGY DEVELOPMENT LLC

Inventor： SETH ADRIAN MILLER ,  THOMAS A. YAGER

IPC: C01B31/04 ,  B05C3/02

CPC classification number: C01B32/194 ,  B05C3/02 ,  B05C3/20 ,  B05D5/12 ,  B32B3/10 ,  B32B9/04 ,  C01B32/182 ,  C01B32/184 ,  Y10T428/24331

Abstract: Technologies are generally described for method and systems effective to at least partially alter a defect in a layer including graphene. In some examples, the methods may include receiving the layer on a substrate where the layer includes at least some graphene and at least some defect areas in the graphene. The defect areas may reveal exposed areas of the substrate. The methods may also include reacting the substrate under sufficient reaction conditions to produce at least one cationic area in at least one of the exposed areas. The methods may further include adhering graphene oxide to the at least one cationic area to produce a graphene oxide layer. The methods may further include reducing the graphene oxide layer to produce at least one altered defect area in the layer.

公开(公告)号：US20130309462A1

公开(公告)日：2013-11-21

申请号：US13950923

申请日：2013-07-25

Applicant: EMPIRE TECHNOLOGY DEVELOPMENT, LLC

Inventor： THOMAS A. YAGER ,  SETH ADRIAN MILLER

IPC: G03F7/26

CPC classification number: G03F7/26 ,  G03F7/091 ,  G03F7/095 ,  Y10T428/12625 ,  Y10T428/24612 ,  Y10T428/24851

Abstract: Technologies are generally described for methods, systems, and structures that include patterns formed by optical lithography. In some example methods, a photoresist layer is applied to a substrate, and a grapheme layer can be applied to the photoresist layer. Light can be applied through a mask to the graphene layer, where the mask includes a pattern. The light can form the pattern on the graphene layer such that the pattern forms on the photoresist layer.

Abstract translation: 通常描述包括通过光学光刻形成的图案的方法，系统和结构的技术。 在一些示例性方法中，将光致抗蚀剂层施加到基板上，并且可以将图形层施加到光致抗蚀剂层。 光可以通过掩模施加到石墨烯层，其中掩模包括图案。 光可以在石墨烯层上形成图案，使得在光致抗蚀剂层上形成图案。