EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS

    公开(公告)号:US20200077501A1

    公开(公告)日:2020-03-05

    申请号:US16677882

    申请日:2019-11-08

    Abstract: An extreme ultraviolet light generation apparatus includes: a chamber in which plasma is generated from a target substance at a condensation position of a laser beam; a condenser mirror configured to condense extreme ultraviolet light generated by the plasma; and a magnetic field generation unit configured to generate a magnetic field that converges a charged particle generated by the plasma toward a wall of the chamber, the condenser mirror includes a substrate, a reflective layer, and a protective layer provided on the reflective layer, the protective layer has layer thickness distribution in which a layer thickness of the protective layer from a reflective layer surface changes, and the layer thickness of the protective layer is maximum at a position on a line (CL) on which a plane passing through a magnetic field axis of the magnetic field generation unit and a central axis (CA) of the condenser mirror intersects the reflective layer surface (62F).

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