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公开(公告)号:US20170231075A1
公开(公告)日:2017-08-10
申请号:US15498902
申请日:2017-04-27
Applicant: Gigaphoton Inc.
Inventor: Hiroshi UMEDA , Kazukiyo KAMIKANNA
Abstract: An extreme ultraviolet light generation device may include: a chamber earthed to a ground, in which extreme ultraviolet light is generated by irradiating a metal target supplied inside with laser light; a target supply unit earthed to the ground and configured to output the target supplied into the chamber from a nozzle; an extraction electrode configured to exert electrostatic force on the target by applying a negative first potential to the extraction electrode; a first power supply configured to apply the first potential to the extraction electrode; an acceleration electrode unit configured to accelerate the target by applying a negative second potential lower than the first potential to the acceleration electrode unit; a second power supply configured to apply the second potential to the acceleration electrode unit; and a charge neutralizer disposed inside the acceleration electrode unit and configured to emit electrons onto the target.
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公开(公告)号:US20190150261A1
公开(公告)日:2019-05-16
申请号:US16244492
申请日:2019-01-10
Applicant: Gigaphoton Inc.
Inventor: Kazukiyo KAMIKANNA , Fumio IWAMOTO
IPC: H05G2/00
Abstract: A droplet collection device may include a collecting container, a collision plate arranged in the collecting container and configured such that a droplet supplied from the opening to the collecting container is to collide with the collision plate, and a buffer member arranged on an opening side with respect to the collision plate and configured to mitigate impact of the droplet colliding with the collision plate. The buffer member may have a wire rod bundle configured such that multiple wire rods are bundled and fixed to a plate member. The wire rods may be made of carbon, and the plate member may be made of graphite. The wire rods may be fixed to the plate member with a graphitized adhesive with the wire rods being arranged in one direction.
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公开(公告)号:US20170307979A1
公开(公告)日:2017-10-26
申请号:US15645295
申请日:2017-07-10
Applicant: Gigaphoton Inc.
Inventor: Tsukasa HORI , Fumio IWAMOTO , Kazukiyo KAMIKANNA
IPC: G03F7/20
CPC classification number: H05G2/008 , G03F7/2002 , G03F7/70033 , H05G2/003 , H05G2/005 , H05G2/006
Abstract: An EUV light generation device generates EUV light stably. The EUV light generation device may include a chamber in which extreme ultraviolet light is generated when a target is irradiated with laser light in a predetermined region inside the chamber, a target supply device configured to output the target to the predetermined region in the chamber to thereby supply the target to the predetermined region, and a target recovery apparatus configured to recover the target output from the target supply device and not irradiated with the laser light. The target recovery apparatus may include a receiver disposed to be inclined with respect to a trajectory of the target output from the target supply device, the receiver being configured to receive the target by allowing the target not irradiated with the laser light to collide with the receiver, and an excitation device configured to vibrate the receiver.
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