公开(公告)号：US20240361698A1

公开(公告)日：2024-10-31

申请号：US18565200

申请日：2022-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus HARTGERS ,  Marco Matheus Louis STEEGHS ,  Gerardus Hubertus Petrus Maria SWINKELS ,  Giovanni IMPONENTE ,  Nicholas William Maria PLANTZ ,  Wouter Joep ENGELEN ,  Marcus Adrianus VAN DE KERKHOF

IPC: G03F7/20

CPC classification number: G03F7/2002

Abstract: A plate for use in an imaging system to determine at least two optical properties of an illumination beam of the imaging system, the imaging system configured to illuminate an illumination region with the illumination beam, the plate including a plurality of markers, wherein a first subset of the plurality of markers includes a first type of markers for determining a first optical property of the illumination beam, and a second subset of the plurality of markers includes a second type of markers for determining a second optical property of the illumination beam, wherein the plurality of markers are located within a marker region of the plate and the marker region generally corresponds to the illumination region.

公开(公告)号：US20240337951A1

公开(公告)日：2024-10-10

申请号：US18745211

申请日：2024-06-17

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Chien-Cheng CHEN ,  Chia-Jen CHEN ,  Hsin-Chang LEE ,  Shih-Ming CHANG ,  Tran-Hui SHEN ,  Yen-Cheng HO ,  Chen-Shao HSU

IPC: G03F7/00 ,  G03F1/36 ,  G03F1/76 ,  G03F1/78 ,  G03F7/20 ,  H01J37/317

CPC classification number: G03F7/70441 ,  G03F1/36 ,  G03F1/78 ,  G03F1/76 ,  G03F7/2002 ,  G03F7/70358 ,  G03F7/70608 ,  G03F7/70616 ,  G03F7/70716 ,  H01J37/3174 ,  H01J2237/31771

Abstract: In a method of manufacturing a photo mask for lithography, circuit pattern data are acquired. A pattern density, which is a total pattern area per predetermined area, is calculated from the circuit pattern data. Dummy pattern data for areas having pattern density less than a threshold density are generated. Mask drawing data is generated from the circuit pattern data and the dummy pattern data. By using an electron beam from an electron beam lithography apparatus, patterns are drawn according to the mask drawing data on a resist layer formed on a mask blank substrate. The drawn resist layer is developed using a developing solution. Dummy patterns included in the dummy pattern data are not printed as a photo mask pattern when the resist layer is exposed with the electron beam and is developed.

公开(公告)号：US20240319603A1

公开(公告)日：2024-09-26

申请号：US18581290

申请日：2024-02-19

Applicant: Applied Materials, Inc.

Inventor： ZHENXING HAN ,  MADHUR SACHAN ,  RUIYING HAO ,  NANCY FUNG ,  LIKUN WANG ,  GABRIELA ALVA

IPC: G03F7/16 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/162 ,  G03F7/0043 ,  G03F7/2002

Abstract: Embodiments disclosed herein include a method of patterning a substrate. In an embodiment, the method comprises depositing a metal-oxo layer over a substrate, and applying a chemically amplified resist (CAR) over the metal-oxo layer. In an embodiment, the method further comprises exposing the CAR, and developing the CAR to form a pattern in the CAR. In an embodiment, the method further comprises transferring the pattern into the metal-oxo layer, and transferring the pattern into the substrate.

公开(公告)号：US20240310726A1

公开(公告)日：2024-09-19

申请号：US18575583

申请日：2022-06-30

Applicant: HELIO DISPLAY MATERIALS LIMITED

Inventor： Gerardus Keyzer DE KEYZER ,  Nobuya SAKAI ,  Bernard WENGER

IPC: G03F7/004 ,  C09K11/02 ,  C09K11/06 ,  G02B5/20 ,  G03F7/00 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0047 ,  C09K11/02 ,  C09K11/06 ,  G02B5/206 ,  G03F7/0007 ,  G03F7/0035 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/0384 ,  G03F7/2002

Abstract: The present invention relates to a process for producing a patterned film comprising particles comprising an AMX compound, which process comprises: (a) providing a photoresist layer disposed on a substrate, which photoresist layer comprises a mixture of a photoresist and particles comprising an AMX compound; (b) defining a pattern on the photoresist layer by exposing regions of the photoresist layer to light and thereby producing a patterned photoresist layer; and (c) treating the patterned photoresist layer with a developer to produce the patterned film comprising particles comprising an AMX compound. The developer may comprise a solvent which has a dielectric constant of at least 6.0. The invention also relates to a process for producing a patterned colour conversion layer and a process for producing a device (such as a display). Further related to the invention is a device intermediate.

公开(公告)号：US20240291220A1

公开(公告)日：2024-08-29

申请号：US18658286

申请日：2024-05-08

Applicant: Gigaphoton Inc.

Inventor： Seiji NOGIWA ,  Takayuki OSANAI

IPC: H01S3/00 ,  G02B27/14 ,  G02F1/35 ,  G02F1/355 ,  G02F1/39 ,  G03F7/00 ,  G03F7/20 ,  H01S5/00

CPC classification number: H01S3/0092 ,  G02F1/3507 ,  G02F1/3534 ,  G02F1/3551 ,  G02F1/392 ,  G03F7/2002 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S5/0085 ,  G02B27/141 ,  G02F2203/11

Abstract: A laser system includes a first laser outputting first laser light, an optical intensity changer outputting first pulse laser light, a modulator widening spectral linewidth of the first laser light or the first pulse laser light, an optical fiber amplifier amplifying the first pulse laser light and outputting second pulse laser light, a second laser outputting second laser light, an optical parametric amplifier amplifying the second laser light and outputting third pulse laser light, a wavelength converter outputting fourth pulse laser light using the second and third pulse laser light, an amplification section amplifying the fourth pulse laser light and outputting fifth pulse laser light, and a processor controlling a modulation signal such that the fifth pulse laser light having target spectral linewidth is generated, and controlling the center wavelength of the second laser light such that the fifth pulse laser light having a target center wavelength is generated.

公开(公告)号：US20240287272A1

公开(公告)日：2024-08-29

申请号：US18579075

申请日：2022-04-20

Applicant: Innofocus Photonics Technology Pty Ltd

Inventor： Baohua JIA ,  Han LIN

IPC: C08J7/06 ,  F28F13/18 ,  G03F7/00 ,  G03F7/16 ,  G03F7/20

CPC classification number: C08J7/06 ,  F28F13/185 ,  G03F7/0012 ,  G03F7/161 ,  G03F7/2002 ,  C08J2323/12 ,  C08J2327/06 ,  C08J2327/14 ,  C08J2333/12 ,  C08J2367/02 ,  C08J2369/00 ,  F28F2245/06 ,  F28F2255/20

Abstract: A radiative cooling film with a surface periodic micro-nano structure can be prepared. The radiative cooling film includes a periodic micro-nano structure layer, a polymer film layer and a reflective coating. The periodic micro-nano structure layer, polymer film layer and the reflective coating can be arranged in a top-down order. Alternatively, the polymer film layer, the periodic micro-nano structure layer and the reflective coating are arranged in a top-down order. A radiation refrigeration film controls the absorption and radiation of the radiative cooling film in the visible light and infrared light bands by adding periodic micro-nano structures on the surface of the polymer film layer. It can increase the infrared radiation to effectively improve the radiative cooling performance and has a high market promotion value.

公开(公告)号：US20240272547A1

公开(公告)日：2024-08-15

申请号：US18620187

申请日：2024-03-28

Applicant: Intel Corporation

Inventor： Charles Cameron Mokhtarzadeh ,  Sanjana Vijay Karpe ,  Scott B. Clendenning ,  James Munro Blackwell ,  Lauren Elizabeth Doyle ,  Brandon Jay Holybee

IPC: G03F7/004 ,  C23C16/40 ,  C23C16/455 ,  C23C16/56 ,  G03F7/00 ,  G03F7/16 ,  G03F7/20 ,  H01L21/033

CPC classification number: G03F7/0042 ,  C23C16/407 ,  C23C16/45534 ,  C23C16/45553 ,  C23C16/56 ,  G03F7/161 ,  G03F7/162 ,  G03F7/2002 ,  G03F7/70033 ,  H01L21/0337

Abstract: Tin carboxylate precursors for metal oxide resist layers and related methods are disclosed herein. An example method of fabricating a semiconductor device disclosed herein includes synthesizing a precursor including tin, depositing a metal oxide resist layer on a base material by applying the precursor, the metal oxide resist layer including tin-6 clusters, and patterning the metal oxide resist layer.

公开(公告)号：US20240248405A1

公开(公告)日：2024-07-25

申请号：US18628911

申请日：2024-04-08

Applicant: FUJIFILM Corporation

Inventor： Hirotoshi ANDO ,  Takehiko HARASAWA ,  Satoshi NAGANO ,  Yasuhiro SEKIZAWA

IPC: G03F7/20 ,  G02F1/1337

CPC classification number: G03F7/2002 ,  G02F1/1337

Abstract: Provided is an exposure method and an exposure device for obtaining a photo-alignment film where the accuracy of an alignment pattern is high, and a method of manufacturing an optically-anisotropic layer. Provided is an exposure method in which linearly polarized light is focused in a ring shape with an optical member to expose a film including a compound having a photo-aligned group, the method including: an exposure step of relatively moving the film and the optical member in an optical axis direction of the optical member while rotating a polarization direction of the linearly polarized light.

公开(公告)号：US20240182616A1

公开(公告)日：2024-06-06

申请号：US18543471

申请日：2023-12-18

Applicant: Align Technology, Inc.

Inventor： Michael Christopher Cole

IPC: C08F220/18 ,  A61C7/08 ,  B29C64/106 ,  B33Y10/00 ,  B33Y70/00 ,  B33Y80/00 ,  C08F2/44 ,  C08F2/48 ,  C08F218/04 ,  C08F220/14 ,  G03F7/029 ,  G03F7/20

CPC classification number: C08F220/1804 ,  A61C7/08 ,  B29C64/106 ,  B33Y10/00 ,  B33Y70/00 ,  B33Y80/00 ,  C08F2/44 ,  C08F2/48 ,  C08F218/04 ,  C08F220/14 ,  C08F220/1811 ,  G03F7/029 ,  G03F7/2002 ,  G03F7/2004 ,  B33Y70/10

Abstract: Systems for fabricating orthodontic appliances are provided. In some embodiments, a system includes a build platform configured to receive a polymerizable composition, the polymerizable composition including a first polymerizable component and a second polymerizable component, the polymerizable composition characterized by an initial ratio of the first polymerizable component to the second polymerizable component. The system can also include a light source configured to form a portion of an orthodontic appliance from the polymerizable composition by: forming a first region by exposing the polymerizable composition to radiation, where the first region includes a first ratio of the first polymerizable component to the second polymerizable component, the first ratio being different from the initial ratio; and forming a second region, where the second region includes a second ratio of the first polymerizable component to the second polymerizable component, the second ratio being different from the initial ratio and the first ratio.

公开(公告)号：US11988958B2

公开(公告)日：2024-05-21

申请号：US16536768

申请日：2019-08-09

Applicant: Inpria Corporation

Inventor： Stephen T. Meyers ,  Douglas A. Keszler ,  Kai Jiang ,  Jeremy T. Anderson ,  Andrew Grenville

IPC: G03F7/004 ,  G03F7/09 ,  G03F7/20 ,  G03F7/30 ,  G03F7/32

CPC classification number: G03F7/0042 ,  G03F7/0043 ,  G03F7/09 ,  G03F7/20 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/30 ,  G03F7/32 ,  G03F7/322 ,  G03F7/325

Abstract: Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.