公开(公告)号：US20190045614A1

公开(公告)日：2019-02-07

申请号：US16155192

申请日：2018-10-09

Applicant: Gigaphoton Inc.

Inventor： Tsukasa HORI ,  Yutaka SHIRAISHI ,  Shinya IKESAKA ,  Takanobu ISHIHARA ,  Toshiro UMEKI

IPC: H05G2/00

Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.

公开(公告)号：US20170280543A1

公开(公告)日：2017-09-28

申请号：US15616167

申请日：2017-06-07

Applicant: Gigaphoton Inc.

Inventor： Tsukasa HORI ,  Yutaka SHIRAISHI ,  Shinya IKESAKA ,  Takanobu ISHIHARA ,  Toshiro UMEKI

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/005 ,  H05G2/008

Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.

公开(公告)号：US20160249443A1

公开(公告)日：2016-08-25

申请号：US15143066

申请日：2016-04-29

Applicant: Gigaphoton Inc.

Inventor： Yutaka SHIRAISHI ,  Toshiyuki HIRASHITA ,  Shinya IKESAKA

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/006 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

Abstract: A target supply device may include: a target generator configured to accommodate a liquid target material and having a nozzle with a nozzle hole from which the liquid target material is outputted; and a filter disposed in the target generator and made of glass, the glass reacting with the liquid target material, so that a solid reaction product is generated. The filter may include a first through-hole configured to allow the liquid target material to pass therethrough, and an inner surface of the first through-hole may be coated with a material which is not easy to react with the liquid target material.

Abstract translation: 目标供给装置可以包括：目标发生器，被配置为容纳液体目标材料，并具有喷嘴，喷嘴孔从所述喷嘴孔输出所述液体目标材料; 以及设置在靶发生器中并由玻璃制成的过滤器，玻璃与液体靶材料反应，从而产生固体反应产物。 过滤器可以包括构造成允许液体目标材料通过的第一通孔，并且第一通孔的内表面可以涂覆有不容易与液体目标材料反应的材料。