-
1.发明申请公开(公告)号：US20200233309A1
公开(公告)日：2020-07-23
申请号：US16842577
申请日：2020-04-07
Applicant: Gigaphoton Inc.
Inventor： Yuki TAKEDA , Yutaka SHIRAISHI
IPC: G03F7/20 , H01L21/027
Abstract: An extreme ultraviolet light generation apparatus that generates plasma by irradiating a target substance with a pulse laser beam and generates extreme ultraviolet light from the plasma includes: a chamber housing a collector mirror configured to condense the extreme ultraviolet light; a gas introduction pipe through which gas is introduced into the chamber; a mass flow controller configured to change the flow rate of the gas; a discharge pump configured to discharge the gas from the chamber; a pressure sensor configured to monitor the pressure in the chamber; and a control unit configured to control the mass flow controller based on the pressure measured by using the pressure sensor. The control unit controls the mass flow controller to increase an increase ratio of the flow rate of the gas entering the chamber as the pressure acquired by the pressure sensor increases.
-
2.发明申请公开(公告)号：US20180007770A1
公开(公告)日：2018-01-04
申请号：US15697954
申请日：2017-09-07
Applicant: Gigaphoton Inc.
Inventor： Takanobu ISHIHARA , Tsukasa HORI , Takashi SAITO , Yutaka SHIRAISHI
CPC classification number: H05G2/006 , G03F7/2004 , G03F7/2008 , H05G2/008
Abstract: A chamber device may include a chamber, and a target generation device assembled into the chamber and configured to supply a target material into the chamber, the target generation device including a tank configured to store the target material, a temperature variable device configured to vary temperature of the target material in the tank, and a nozzle section in which a nozzle hole configured to output the target material in a liquid form is formed, and the chamber device may further include a gas nozzle having an inlet port facing the nozzle section and configured to introduce gas into the chamber, a gas supply source configured to supply gas containing hydrogen to the gas nozzle to supply the gas containing the hydrogen to at least periphery of the nozzle section, and a moisture remover configured to remove moisture at least in the periphery of the nozzle section in the chamber.
-
3.发明申请公开(公告)号：US20200341383A1
公开(公告)日：2020-10-29
申请号：US16925567
申请日：2020-07-10
Applicant: Gigaphoton Inc.
Inventor： Fumio IWAMOTO , Yutaka SHIRAISHI , Tsukasa HORI
Abstract: A target supply device includes a tank body portion holding a target substance; a communication portion connected to the tank body portion and including a filter that filters the melted target substance and a nozzle that discharges the target substance having passed through the filter; a main heater that heats the tank body portion; a sub-heater that heats the communication portion; and a control unit, the control unit being configured to set the main heater to a temperature higher than a melting point of the target substance before the target substance is melted, to set the sub-heater to a temperature lower than the melting point of the target substance until the target substance in the tank body portion is melted, and to set the sub-heater to a temperature higher than the melting point of the target substance after the target substance in the tank body portion is melted.
-
公开(公告)号：US20190289705A1
公开(公告)日：2019-09-19
申请号：US16429331
申请日：2019-06-03
Applicant: Gigaphoton Inc.
Inventor： Takanobu ISHIHARA , Toshihiro NISHISAKA , Yutaka SHIRAISHI
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; a target supply unit that supplies a droplet of a target substance to a plasma generation region in the chamber; a first pipe at least partly covering a trajectory of the droplet and having a first opened end part as an upstream end part and a second opened end part as a downstream end part in a trajectory direction; a second pipe at least partly covering the first pipe with a gap between the second pipe and the first pipe, and having a third end part, opened and extending downstream of the second end part of the first pipe in the trajectory direction, as a downstream end part in the trajectory direction; and a gas supply unit that supplies gas flowing through the gap and causes the gas to flow in the trajectory direction out of a gas exit.
-
公开(公告)号：US20190155163A1
公开(公告)日：2019-05-23
申请号：US16261329
申请日：2019-01-29
Applicant: Gigaphoton Inc.
Inventor： Yutaka SHIRAISHI , Toshihiro NISHISAKA
CPC classification number: G03F7/70033 , G03F7/20 , H05G2/00 , H05G2/008
Abstract: A target generation device according to one aspect of the present disclosure includes a tank for containing a target substance, a heater provided at the tank, a nozzle communicating with the inside of the tank, a lid having a gas inlet port communicating with the inside of the tank, and a plurality of shielding plates that are disposed inside the tank and suppress entry of the target substance to the gas inlet port. Each of the shielding plates includes at least one non-shielding region for allowing the gas to pass through. The non-shielding regions of at least two of the shielding plates are arranged at positions in which one of the non-shielding regions of the at least two of the shielding plates is not seen into the other of the non-shielding regions of the at least two of the shielding plates.
-
Patent Agency Ranking
6.发明申请公开(公告)号：US20150144809A1
公开(公告)日：2015-05-28
申请号：US14611914
申请日：2015-02-02
Applicant: GIGAPHOTON INC.
Inventor： Shinji OKAZAKI , Takanobu ISHIHARA , Yutaka SHIRAISHI
IPC: H05G2/00
Abstract: A target supply device may include: a tank including a storage portion that stores a target material and a supply portion that is in communication with the storage portion, the target material flowing into the supply portion; a nozzle including a nozzle hole that is in communication with the supply portion to be fed with the target material; and a coating portion that covers a wall surface of the nozzle hole.
Abstract translation: 目标供给装置可以包括：储存器，包括存储目标材料的存储部分和与所述存储部分连通的供应部分，所述目标材料流入所述供应部分; 喷嘴，其包括与要供给的目标材料的供给部连通的喷嘴孔; 以及覆盖喷嘴孔的壁面的涂布部。
-
7.发明公开公开(公告)号：US20230142875A1
公开(公告)日：2023-05-11
申请号：US17934469
申请日：2022-09-22
Applicant: Gigaphoton Inc.
Inventor： Fumio IWAMOTO , Yutaka SHIRAISHI
CPC classification number: H05G2/006 , H05G2/008 , G01N21/88 , G03F7/70033 , G03F7/70608
Abstract: An EUV light generation apparatus to generate EUV light by irradiating a target with pulse laser light to turn the target into plasma includes a chamber, a target supply unit configured to supply the target to a plasma generation region in the chamber, a pulse laser device configured to generate pulse laser light to be radiated to the target, and a processor configured to change a generation frequency of the target generated by the target supply unit to a natural number multiple of an irradiation frequency of the pulse laser light based on a size of the target or related information related to the size of the target.
-
公开(公告)号：US20210364927A1
公开(公告)日：2021-11-25
申请号：US17228000
申请日：2021-04-12
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Yutaka SHIRAISHI , Toshihiro NISHISAKA , Hiroshi SOMEYA , Yukio WATANABE
Abstract: A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.
-
公开(公告)号：US20180160518A1
公开(公告)日：2018-06-07
申请号：US15888111
申请日：2018-02-05
Applicant: Gigaphoton Inc.
Inventor： Yutaka SHIRAISHI , Toshihiro NISHISAKA , Toshiyuki HIRASHITA , Takuya ISHII
IPC: H05G2/00
Abstract: A target storage device may include a tank configured to store a target that generates extreme ultraviolet light when being irradiated with laser light, a heater connected with the tank and configured to heat the tank, and a radiation member disposed to cover at least a part of the tank connected with the heater and configured to reflect heat radiation from the tank and the heater toward the tank.
-
公开(公告)号：US20170280543A1
公开(公告)日：2017-09-28
申请号：US15616167
申请日：2017-06-07
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Yutaka SHIRAISHI , Shinya IKESAKA , Takanobu ISHIHARA , Toshiro UMEKI
IPC: H05G2/00
Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
-
-
-
-
-
-
-
-
-
Search Results
23
records
(took 0.026 seconds)
