-
公开(公告)号：US20170280543A1
公开(公告)日：2017-09-28
申请号：US15616167
申请日：2017-06-07
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Yutaka SHIRAISHI , Shinya IKESAKA , Takanobu ISHIHARA , Toshiro UMEKI
IPC: H05G2/00
Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
-
公开(公告)号：US20190045614A1
公开(公告)日：2019-02-07
申请号：US16155192
申请日：2018-10-09
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Yutaka SHIRAISHI , Shinya IKESAKA , Takanobu ISHIHARA , Toshiro UMEKI
IPC: H05G2/00
Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
-
Search Results
2
records
(took 0.014 seconds)
