Antireflective compositions for photoresists
    1.
    发明授权
    Antireflective compositions for photoresists 有权
    用于光致抗蚀剂的抗反射组合物

    公开(公告)号:US07264913B2

    公开(公告)日:2007-09-04

    申请号:US10301462

    申请日:2002-11-21

    摘要: The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3, where, Y is a hydrocarbyl linking group of 1 to about 10 carbon atoms, R, R1, R′ and R″ are independently hydrogen, hydrocarbyl group of 1 to about 10 carbon atoms, halogen, —O(CO)Z, —C(CF3)2Z, —C(CF3)2(CO)OZ, —SO2CF3, —(CO)OZ, —SO3Z, —COZ, —OZ, —NZ2, —SZ, —SO2Z, —NHCOZ, —NZCOZ or —SO2NZ2, where Z is H or a hydrocarbyl group of 1 to about 10 carbon atoms, n=1–4, X is O, CO, S, COO, CH2O, CH2COO, SO2, NH, NL, OWO, OW, W, and where L and W are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and m=0–3.

    摘要翻译: 本发明涉及包含聚合物,交联剂和酸发生剂的新型抗反射涂料组合物。 本发明还涉及使用该组合物的方法,特别是在193nm。 本发明的聚合物含有至少一种选自结构1,2和3的单元,其中Y是1至约10个碳原子的烃基连接基团,R 1,R 1,R' 和R“独立地为氢,1至约10个碳原子的烃基,卤素,-O(CO)Z,-C(CF 3)2 Z, -C(CF 3)2(CO)OZ,-SO 2 CF 3 - , - (CO) OZ,-SO 3 Z,-COZ,-OZ,-NZ 2,-SZ,-SO 2 Z,-NHCOZ, - NZCOZ或-SO 2 NZ 2,其中Z为H或1至约10个碳原子的烃基,n = 1-4,X为O,CO, S,COO,CH 2 O,CH 2 COO,SO 2,NH,NL,OWO,OW,W,其中L和 W独立地为1至约10个碳原子的烃基,并且m = 0-3。