公开(公告)号：US07160812B2

公开(公告)日：2007-01-09

申请号：US10361823

申请日：2003-02-11

Applicant: Hideshi Hamada

Inventor： Hideshi Hamada

IPC: H01L21/302 ,  H01L21/3065 ,  C25F3/30

CPC classification number: H01L21/67069 ,  H01J37/32724 ,  H01J37/32862

Abstract: A method for preventing the deterioration of an electrode caused by the build up of deposits in openings of the electrode. Gas is supplied to each of the openings in order to prevent deposits from adhering to the openings before or after the etching treatment.

Abstract translation: 一种用于防止由电极开口中的沉积物积聚引起的电极劣化的方法。 为了防止在蚀刻处理之前或之后的沉积物附着在开口上，向每个开口供给气体。