Invention Grant
US07160812B2 Method for preventing electrode deterioration in etching apparatus
失效
用于防止蚀刻装置中的电极劣化的方法
- Patent Title: Method for preventing electrode deterioration in etching apparatus
- Patent Title (中): 用于防止蚀刻装置中的电极劣化的方法
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Application No.: US10361823Application Date: 2003-02-11
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Publication No.: US07160812B2Publication Date: 2007-01-09
- Inventor: Hideshi Hamada
- Applicant: Hideshi Hamada
- Applicant Address: JP Tokyo
- Assignee: Oki Electric Industry Co., Ltd.
- Current Assignee: Oki Electric Industry Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: VolentineFrancos&Whitt,PLLC
- Priority: JP2002-206640 20020716; JP2003-015680 20030124
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/3065 ; C25F3/30
Abstract:
A method for preventing the deterioration of an electrode caused by the build up of deposits in openings of the electrode. Gas is supplied to each of the openings in order to prevent deposits from adhering to the openings before or after the etching treatment.
Public/Granted literature
- US20040014324A1 Method for preventing electrode deterioration in etching apparatus Public/Granted day:2004-01-22
Information query
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