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1.发明授权Method of making a workpiece at a uniform potential during cathode sputtering 失效在阴极溅射过程中在均匀电位下制作工件的方法
公开(公告)号：US3423303A
公开(公告)日：1969-01-21
申请号：US3423303D
申请日：1966-07-21
Applicant: IBM
Inventor： DAVIDSE PIETER D , KOSTER LAWRENCE R , HIMES WALTER
CPC classification number: H01J37/34 , Y10S422/906
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