公开(公告)号：US20170159196A1

公开(公告)日：2017-06-08

申请号：US15250945

申请日：2016-08-30

Applicant: Industrial Technology Research Institute

Inventor： Chun-Fu Lu ,  Ya-Ching Chou ,  Li-Wei Liu ,  Hsin-Hwa Chen

IPC: C25D5/06 ,  C25D21/14 ,  C25D21/18

CPC classification number: C25D5/06 ,  C25D21/14 ,  C25D21/18

Abstract: An electrical deposition apparatus includes a brush plating head. The brush plating head includes a plurality of channels, and there are openings at the same surface of the brush plating head. Each of the channels extends from within the brush plating head to each of the openings.