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公开(公告)号:US20200084880A1
公开(公告)日:2020-03-12
申请号:US16469105
申请日:2017-11-22
Applicant: Intel Corporation
Inventor: Ping Ping Ooi , Bok Eng Cheah , Jackson Chung Peng Kong , Kool Chi Ooi
IPC: H05K1/02 , H01L23/498 , H01L21/48 , H01L23/538 , H01L25/065
Abstract: A multi-conductor interconnect for a microelectronic device incorporates multiple conductors and integrated shielding for the conductors. The multi-conductor interconnect includes first and second groups of conductors interleaved with one another within a dielectric structure. One of the groups of conductors may be coupled to a reference voltage node to provide shielding for the other group of conductors. The multi-conductor interconnect may further include a shield layer extending over some portion, or all, of the conductors of the first and second groups.
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2.
公开(公告)号:US20190304885A1
公开(公告)日:2019-10-03
申请号:US16279656
申请日:2019-02-19
Applicant: Intel Corporation
Inventor: Bok Eng Cheah , Jackson Chung Peng Kong , Kool Chi Ooi , Yang Liang Poh
IPC: H01L23/498 , H01L21/48
Abstract: A semiconductor package substrate includes an encapsulated interconnect on a land side of the substrate. The encapsulated interconnect includes an integral metallic structure that has a smaller contact end against the semiconductor package substrate, and a larger contact end for board mounting.
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