公开(公告)号：US5715851A

公开(公告)日：1998-02-10

申请号：US506760

申请日：1995-07-26

申请人： Jae-hyung Jung ,  Young-hwan Yun ,  Ho-seung Chang

发明人： Jae-hyung Jung ,  Young-hwan Yun ,  Ho-seung Chang

IPC分类号： H01L21/673 ,  B08B3/12 ,  B08B11/02 ,  H01L21/00 ,  H01L21/304 ,  B08B3/10

CPC分类号： H01L21/67023 ,  B08B11/02 ,  B08B3/12 ,  Y10S134/902

摘要： A wafer cassette through which a sonic wave is evenly transferred to a substrate in a quartz bath, and a cleaning system adopting the wafer cassette are provided. In the wafer cassette, a hole for evenly transferring the sonic wave to the substrate is formed. The cleaning system includes a vibration plate for generating a sonic wave, placed at the lowest portion of the cleaning system, a sink placed on the vibration plate, a quartz bath placed in the sink and spaced from the bottom of the sink, in which a wafer cassette is placed, a plurality of water supplies for supplying a cleaning solution, placed in the bottom of the quartz bath and a water drain for draining the cleaning solution overflown from the quartz bath, placed on the bottom of the sink, opposite to the water supplies, wherein the vibration plate is placed between the water drain and the water supplies. As a result, the oscillation frequency does not deviate from the setting value and air bubbles are not formed at the lower portion of the quartz bath, so that the irregular reflection of the sonic wave is restricted. Thus, the sonic wave is evenly transferred to the wafer, thereby enhancing the capability of removing the particles from the substrate.

摘要翻译： 提供了将声波在石英槽中均匀地转移到基板的晶片盒，以及采用该晶片盒的清洁系统。 在晶片盒中，形成用于将声波均匀地传递到基板的孔。 清洁系统包括用于产生声波的振动板，放置在清洁系统的最低部分，放置在振动板上的水槽，放置在水槽中并与水槽底部间隔开的石英浴，其中 放置晶片盒，放置在石英池底部的多个用于供应清洗液的供水装置，以及放置在与水槽相对的水槽底部的用于排出从石英池溢出的清洗液的排水口 水源，其中振动板放置在排水口和水源之间。 结果，振荡频率并没有偏离设定值，并且在石英槽的下部没有形成气泡，从而限制了声波的不规则反射。 因此，声波被均匀地转移到晶片，从而增强了从基底去除颗粒的能力。