公开(公告)号：US5715851A

公开(公告)日：1998-02-10

申请号：US506760

申请日：1995-07-26

申请人： Jae-hyung Jung ,  Young-hwan Yun ,  Ho-seung Chang

发明人： Jae-hyung Jung ,  Young-hwan Yun ,  Ho-seung Chang

IPC分类号： H01L21/673 ,  B08B3/12 ,  B08B11/02 ,  H01L21/00 ,  H01L21/304 ,  B08B3/10

CPC分类号： H01L21/67023 ,  B08B11/02 ,  B08B3/12 ,  Y10S134/902

摘要： A wafer cassette through which a sonic wave is evenly transferred to a substrate in a quartz bath, and a cleaning system adopting the wafer cassette are provided. In the wafer cassette, a hole for evenly transferring the sonic wave to the substrate is formed. The cleaning system includes a vibration plate for generating a sonic wave, placed at the lowest portion of the cleaning system, a sink placed on the vibration plate, a quartz bath placed in the sink and spaced from the bottom of the sink, in which a wafer cassette is placed, a plurality of water supplies for supplying a cleaning solution, placed in the bottom of the quartz bath and a water drain for draining the cleaning solution overflown from the quartz bath, placed on the bottom of the sink, opposite to the water supplies, wherein the vibration plate is placed between the water drain and the water supplies. As a result, the oscillation frequency does not deviate from the setting value and air bubbles are not formed at the lower portion of the quartz bath, so that the irregular reflection of the sonic wave is restricted. Thus, the sonic wave is evenly transferred to the wafer, thereby enhancing the capability of removing the particles from the substrate.

摘要翻译： 提供了将声波在石英槽中均匀地转移到基板的晶片盒，以及采用该晶片盒的清洁系统。 在晶片盒中，形成用于将声波均匀地传递到基板的孔。 清洁系统包括用于产生声波的振动板，放置在清洁系统的最低部分，放置在振动板上的水槽，放置在水槽中并与水槽底部间隔开的石英浴，其中 放置晶片盒，放置在石英池底部的多个用于供应清洗液的供水装置，以及放置在与水槽相对的水槽底部的用于排出从石英池溢出的清洗液的排水口 水源，其中振动板放置在排水口和水源之间。 结果，振荡频率并没有偏离设定值，并且在石英槽的下部没有形成气泡，从而限制了声波的不规则反射。 因此，声波被均匀地转移到晶片，从而增强了从基底去除颗粒的能力。

公开(公告)号：US6059986A

公开(公告)日：2000-05-09

申请号：US144254

申请日：1998-08-31

申请人： Jae-hyung Jung ,  Young-hwan Yun ,  Se-jong Ko ,  Min-sang Yun

发明人： Jae-hyung Jung ,  Young-hwan Yun ,  Se-jong Ko ,  Min-sang Yun

IPC分类号： H01L21/306 ,  H01L21/00 ,  H01L21/304 ,  C23F1/02 ,  G05D23/00 ,  H05B1/00

CPC分类号： H01L21/67086 ,  H01L21/67057

摘要： A wet station apparatus used for cleaning and wet etching a semiconductor wafer includes a chemical container for holding a chemical solution, a temperature measuring device for measuring a temperature of the chemical solution, a temperature control unit for comparing the temperature measured by the temperature measuring device with a predetermined reference temperature value, and outputting the result as a control signal, a quartz heater for heating the chemical solution, a power supply controller for receiving the control signal and adjusting the power supplied to the quartz heater, and a power switch connected to the power supply controller, for receiving a heating initiation signal and switching power to the quartz heater, wherein a heater monitoring system is further provided for monitoring the operating states of the quartz heater and the power supply controller and notifying an operator of any problems.

摘要翻译： 用于清洗和湿蚀半导体晶片的湿站装置包括用于保存化学溶液的化学容器，用于测量化学溶液的温度的温度测量装置，用于比较由温度测量装置测量的温度的温度控制单元 具有预定的参考温度值，并输出作为控制信号的结果，用于加热化学溶液的石英加热器，用于接收控制信号并调节供应到石英加热器的功率的电源控制器，以及连接到 电源控制器，用于接收加热启动信号和切换到石英加热器的电力，其中进一步提供加热器监控系统，用于监视石英加热器和电源控制器的运行状态，并通知操作者任何问题。

公开(公告)号：US06235147B1

公开(公告)日：2001-05-22

申请号：US09406887

申请日：1999-09-28

申请人： Seung-kun Lee ,  Jae-hyung Jung ,  Young-hwan Yun ,  Gyu-hwan Kwag

发明人： Seung-kun Lee ,  Jae-hyung Jung ,  Young-hwan Yun ,  Gyu-hwan Kwag

IPC分类号： B08B302

CPC分类号： H01L21/67086 ,  H01L21/6708

摘要： There is provided a wet-etching facility for manufacturing semiconductor devices, wherein the etching process is performed for a wafer with its used surface facing downward so that the by-products from the etching process are completely removed from the etching groove of the wafer by gravity, and the impurities on the back side of the wafer are sank down, and are not touched to the used surface of the other wafer thereby producing good quality of wafers. The wet-etching facility for manufacturing semiconductor devices comprises a bath containing an amount of chemical; a chemical supply part for supplying an amount of chemical to the bath; a chemical discharge part for discharging the chemical inside the bath to the outside; a wafer guide holding and fixing a wafer with its used surface facing downward, and placing the wafer into a chemical; a transfer robot for loading and unloading the wafer into the wafer guide; and a chemical spray part for spraying the chemical at a high pressure such that the chemical flows along a surface of the wafer.

摘要翻译： 提供了用于制造半导体器件的湿式蚀刻设备，其中对于其使用的表面朝下的晶片执行蚀刻处理，使得来自蚀刻工艺的副产物通过重力从晶片的蚀刻蚀刻槽完全去除 ，并且晶片背面的杂质沉没，并且不会接触另一晶片的使用表面，从而产生良好的晶片质量。用于制造半导体器件的湿式蚀刻设备包括含有一定量的 化学品 用于向浴提供一定量的化学品的化学品供应部件; 用于将浴内的化学物质排放到外部的化学物排放部分; 将晶片的使用面向下保持并固定的晶片导板，将晶片放入化学品中; 用于将晶片装载和卸载到晶片引导件中的传送机器人; 以及用于在高压下喷射化学品使化学品沿着晶片表面流动的化学喷涂部件。

公开(公告)号：US5944939A

公开(公告)日：1999-08-31

申请号：US735454

申请日：1996-10-23

申请人： Jae-hyung Jung ,  Young-hwan Yun ,  Se-jong Ko ,  Min-sang Yun

发明人： Jae-hyung Jung ,  Young-hwan Yun ,  Se-jong Ko ,  Min-sang Yun

IPC分类号： H01L21/306 ,  H01L21/00 ,  H01L21/304 ,  C23F1/02

CPC分类号： H01L21/67086 ,  H01L21/67057

摘要： A wet station apparatus used for cleaning and wet etching a semiconductor wafer includes a chemical container for holding a chemical solution, a temperature measuring device for measuring a temperature of the chemical solution, a temperature control unit for comparing the temperature measured by the temperature measuring device with a predetermined reference temperature value, and outputting the result as a control signal, a quartz heater for heating the chemical solution, a power supply controller for receiving the control signal and adjusting the power supplied to the quartz heater, and a power switch connected to the power supply controller, for receiving a heating initiation signal and switching power to the quartz heater, wherein a heater monitoring system is further provided for monitoring the operating states of the quartz heater and the power supply controller and notifying an operator of any problems.