公开(公告)号：US20160246142A1

公开(公告)日：2016-08-25

申请号：US15146939

申请日：2016-05-05

Applicant: Japan Display Inc.

Inventor： Toshimasa ISHIGAKI ,  Fumio TAKAHASHI ,  Hideki KURIYAMA

IPC: G02F1/1362 ,  H01L27/12

CPC classification number: G02F1/136227 ,  G02F2201/40 ,  H01L21/02112 ,  H01L21/288 ,  H01L27/1248 ,  H01L27/1259 ,  H01L29/78606 ,  H01L33/08

Abstract: A manufacturing method of a display device having an array substrate includes the steps of forming a projection of an organic material in a pixel on the array substrate by patterning a photosensitive material or by inkjet, forming a TFT on the array substrate, wherein a source electrode of the TFT is formed to extend on at least part of the upper surface of the projection, forming an inorganic passivation layer over the TFT and over at least part of the upper surface of the projection, forming an organic passivation layer over the inorganic passivation layer, forming an upper insulating layer over at least part of the organic passivation layer, forming a contact hole in the inorganic passivation layer and the upper insulation layer over the upper surface of the projection, and forming a pixel electrode on the upper insulation layer which contacts the source electrode.

Abstract translation: 具有阵列基板的显示装置的制造方法包括以下步骤：通过图案化感光材料或通过喷墨形成阵列基板上的像素中的有机材料的突起，在阵列基板上形成TFT，其中源电极 形成为在突起的上表面的至少一部分上延伸，在TFT上方以及在突起的上表面的至少一部分之上形成无机钝化层，在无机钝化层上形成有机钝化层 在所述有机钝化层的至少一部分上形成上绝缘层，在所述无机钝化层和所述突起的上表面上方形成上绝缘层的接触孔，并在所述上绝缘层上形成像素电极， 源电极。

公开(公告)号：US20150318404A1

公开(公告)日：2015-11-05

申请号：US14798413

申请日：2015-07-13

Applicant: Japan Display Inc.

Inventor： Toshimasa ISHIGAKI ,  Fumio TAKAHASHI ,  Hideki KURIYAMA

IPC: H01L29/786 ,  H01L27/12

CPC classification number: G02F1/136227 ,  G02F2201/40 ,  H01L21/02112 ,  H01L21/288 ,  H01L27/1248 ,  H01L27/1259 ,  H01L29/78606 ,  H01L33/08

Abstract: A manufacturing method of a display device having an array substrate includes the steps of forming a projection of an organic material in a pixel on the array substrate by patterning a photosensitive material or by inkjet, forming a TFT on the array substrate, wherein a source electrode of the TFT is formed to extend on at least part of the upper surface of the projection, forming an inorganic passivation layer over the TFT and over at least part of the upper surface of the projection, forming an organic passivation layer over the inorganic passivation layer, forming an upper insulating layer over at least part of the organic passivation layer, forming a contact hole in the inorganic passivation layer and the upper insulation layer over the upper surface of the projection, and forming a pixel electrode on the upper insulation layer which contacts the source electrode.

Abstract translation: 具有阵列基板的显示装置的制造方法包括以下步骤：通过图案化感光材料或通过喷墨形成阵列基板上的像素中的有机材料的突起，在阵列基板上形成TFT，其中源电极 形成为在突起的上表面的至少一部分上延伸，在TFT上方以及在突起的上表面的至少一部分之上形成无机钝化层，在无机钝化层上形成有机钝化层 在所述有机钝化层的至少一部分上形成上绝缘层，在所述无机钝化层和所述突起的上表面上方形成上绝缘层的接触孔，并在所述上绝缘层上形成像素电极， 源电极。