FOCUS DETECTION APPARATUS FOR PROJECTION LITHOGRAPHY SYSTEM
    1.
    发明申请
    FOCUS DETECTION APPARATUS FOR PROJECTION LITHOGRAPHY SYSTEM 失效
    用于投影光刻系统的焦点检测装置

    公开(公告)号:US20130027679A1

    公开(公告)日:2013-01-31

    申请号:US13464321

    申请日:2012-05-04

    IPC分类号: G03B27/70

    CPC分类号: G03F9/7026 G03F9/7061

    摘要: Disclosed is a focus detection apparatus for a projection lithography system. The apparatus comprises: a laser; a focus optical unit configured to focusing the emitted laser beam; a force detection unit configured to reflect the focused laser beam at the backside; a position detection unit configured to detect variations in position of a light spot formed by the reflected laser beam, and output a strength signal indicating the strength of the interaction force between the force detection unit and the object; a differential amplifier configured to output a Z-direction differential signal based on the strength signal and a reference signal; a Z-direction feedback control unit configured to perform feedback control; and a scan signal generator configured to output a signal for controlling the movement of the stage in the XY plane. The focus detection apparatus has high precision, efficiency and process applicability.

    摘要翻译: 公开了一种用于投影光刻系统的焦点检测装置。 该装置包括:激光器; 被配置为聚焦所发射的激光束的聚焦光学单元; 力检测单元,被配置为将聚焦的激光束反射到背面; 位置检测单元,被配置为检测由所述反射的激光束形成的光点的位置的变化,并且输出表示所述力检测单元与所述物体之间的相互作用力的强度的强度信号; 差分放大器,被配置为基于强度信号和参考信号输出Z​​方向差分信号; 配置为执行反馈控制的Z方向反馈控制单元; 以及扫描信号发生器,被配置为输出用于控制所述载物台在XY平面中的运动的信号。 焦点检测装置具有高精度,高效率和工艺适用性。