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公开(公告)号：US11131629B2
公开(公告)日：2021-09-28
申请号：US15882951
申请日：2018-01-29
Applicant: KLA-Tencor Corporation
Inventor： Abdurrahman Sezginer , Kuljit Virk , Eric Vella
Abstract: In one embodiment, disclosed are apparatus, methods, and targets for determining a phase shift of a photomask having a phase-shift target. An inspection or metrology system is used to direct an incident beam towards the target and then detect a plurality of intensity measurements that are transmitted through the target in response to the incident beam. A phase shift value for the target may then be determined based on the intensity measurements.
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公开(公告)号：US20170069080A1
公开(公告)日：2017-03-09
申请号：US15250649
申请日：2016-08-29
Applicant: KLA-Tencor Corporation
Inventor： Abdurrahman Sezginer , Eric Vella , Balaji Ganapathy , Yanwei Liu
CPC classification number: G06T7/0006 , G06T7/001 , G06T7/62 , G06T2207/10004 , G06T2207/10056 , G06T2207/30148
Abstract: A reticle is inspected with an imaging system to obtain a measured image of a structure on the reticle, and the structure has an unknown critical dimension (CD). Using a model, a calculated image is generated using a design database that describes a pattern used to form the structure on the reticle. The model generates the calculated image based on: optical properties of reticle materials of the structure, a computational model of the imaging system, and an adjustable CD. A norm of a difference between the measured and calculated images is minimized by adjusting the adjustable CD and iteratively repeating the operation of generating a calculated image so as to obtain a final CD for the unknown CD of the structure. Minimizing the norm of the difference is performed simultaneously with respect to the adjustable CD and one or more uncertain parameters of the imaging system.
Abstract translation: 用成像系统检查掩模版，以获得在光罩上的结构的测量图像，并且该结构具有未知的临界尺寸（CD）。 使用模型，使用描述用于在分划板上形成结构的图案的设计数据库生成计算图像。 该模型基于：结构的标线材料的光学性质，成像系统的计算模型和可调节的CD产生计算的图像。 通过调整可调节的CD并迭代地重复生成计算图像的操作以获得结构的未知CD的最终CD，使得测量和计算的图像之间的差异范围最小化。 相对于可调节CD和成像系统的一个或多个不确定参数同时实现差异范围的最小化。
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公开(公告)号：US20180340886A1
公开(公告)日：2018-11-29
申请号：US15882951
申请日：2018-01-29
Applicant: KLA-Tencor Corporation
Inventor： Abdurrahman Sezginer , Kuljit Virk , Eric Vella
Abstract: In one embodiment, disclosed are apparatus, methods, and targets for determining a phase shift of a photomask having a phase-shift target. An inspection or metrology system is used to direct an incident beam towards the target and then detect a plurality of intensity measurements that are transmitted through the target in response to the incident beam. A phase shift value for the target may then be determined based on the intensity measurements.
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公开(公告)号：US09875534B2
公开(公告)日：2018-01-23
申请号：US15250649
申请日：2016-08-29
Applicant: KLA-Tencor Corporation
Inventor： Abdurrahman Sezginer , Eric Vella , Balaji Ganapathy , Yanwei Liu
CPC classification number: G06T7/0006 , G06T7/001 , G06T7/62 , G06T2207/10004 , G06T2207/10056 , G06T2207/30148
Abstract: A reticle is inspected with an imaging system to obtain a measured image of a structure on the reticle, and the structure has an unknown critical dimension (CD). Using a model, a calculated image is generated using a design database that describes a pattern used to form the structure on the reticle. The model generates the calculated image based on: optical properties of reticle materials of the structure, a computational model of the imaging system, and an adjustable CD. A norm of a difference between the measured and calculated images is minimized by adjusting the adjustable CD and iteratively repeating the operation of generating a calculated image so as to obtain a final CD for the unknown CD of the structure. Minimizing the norm of the difference is performed simultaneously with respect to the adjustable CD and one or more uncertain parameters of the imaging system.
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