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公开(公告)号:US20220149217A1
公开(公告)日:2022-05-12
申请号:US17454404
申请日:2021-11-10
Inventor: Sanghyeon KIM , DaeMyeong GEUM , SeungYeop AHN , Jinha LIM
IPC: H01L31/0352 , H01L31/0232 , H01L27/144 , H01L49/02 , H01L31/18
Abstract: Various embodiments relate to a superlattice photodetector and a method of manufacturing the same. The superlattice photodetector includes an absorption layer for absorbing incident light and a waveguide layer coupled with the absorption layer and enabling the incident light to be waveguided within the absorption layer. The waveguide layer may include a periodic structure in which a plurality of metal patterns and a plurality of dielectric patterns are repeatedly arranged. According to various embodiments, the superlattice photodetector can be thinned while having improved performance.