Patent search ap:("KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY") AND inv:"Dongjun LEE" Page 1

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发明申请
MASKING BLOCK THAT IS EASILY BONDABLE AND DEBONDABLE, METHOD FOR MANUFACTURING MASKING BLOCK AND METHOD FOR FORMING PATTERN OF TWO-DIMENSIONAL MATERIAL USING MASKING BLOCK 有权

公开(公告)号：US20210164096A1

公开(公告)日：2021-06-03

申请号：US16880432

申请日：2020-05-21

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Jaehyun PARK , Dongjun LEE

IPC: C23C16/34 , C23C16/04 , C23C16/02

Abstract: A masking block includes a base substrate, a gamma-alumina thin film disposed on the base substrate, and a hexagonal boron nitride thin film doped with carbon and oxygen and disposed on the gamma-alumina thin film. An amount of carbon in the hexagonal boron nitride thin film is 1 at % to 15 at %.

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