公开(公告)号：US20230136591A1

公开(公告)日：2023-05-04

申请号：US17570386

申请日：2022-01-07

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Chong Min KOO ,  Tae Gon OH ,  Seung Jun LEE ,  Seon Joon KIM ,  Soon Man HONG ,  Seung Sang HWANG ,  Albert Lee

IPC: C09K13/06

Abstract: The present invention relates to an etching composition and a method of producing a MXene. The etching composition of the present invention can stably and quickly produce a MXene at high temperature. The etching composition of the present invention can produce a MXene in high yield. The etching composition of the present invention can easily produce various types of MXenes. A method using the etching composition of the present invention can produce a MXene having excellent electrochemical and mechanical properties.