公开(公告)号：US5540782A

公开(公告)日：1996-07-30

申请号：US135481

申请日：1993-10-13

申请人： Katsushin Miyagi ,  Miyuki Yamahara

发明人： Katsushin Miyagi ,  Miyuki Yamahara

IPC分类号： C23C16/46 ,  C23C16/54 ,  C30B25/10 ,  C30B31/12 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01L21/67115 ,  C23C16/46 ,  C23C16/54 ,  C30B25/10 ,  C30B31/12

摘要： A heat-treating apparatus for heat treating a plurality of objects-to-be-treated (semiconductor wafers) by loading the objects-to-be-treated into a heat treatment vessel having the lower end opened, mounted on a heat-treatment boat vertically spaced from each other, and sealing the opened end includes a heat insulator disposed on the lower end portion of the heat-treatment boat for heat-insulating the interior of the reaction vessel. The heat-insulator includes heat transmission preventing plates of opaque quartz for preventing the transmission of heat rays from a heater, and a support for supporting the heat transmission preventing plates. Thus sufficient heat-insulating effect for a heat-treating operation can be achieved, and stable heat-treatment can be conducted without impairing the function of sealing the heat-insulating unit. Furthermore, particle formation can be prevented, with a result of improved yields of the heat-treatment.

摘要翻译： 一种热处理装置，用于通过将待处理物体加载到具有下端打开的热处理容器中来热处理多个被处理物体（半导体晶片），所述热处理容器安装在热处理舟 并且密封开放端包括设置在热处理舟皿的下端部上的绝热体，用于对反应容器的内部进行绝热。 绝热体包括防止来自加热器的热射线的不透明石英的防热板，以及用于支撑防热板的支撑体。 因此，可以实现热处理操作的充分的绝热效果，并且可以进行稳定的热处理，而不会损害绝热单元的密封功能。 此外，可以防止颗粒形成，结果是热处理的产率提高。