Abstract:
The invention relates to compositions for removing nail polish comprising a C2-C3 monoalcohol, glycerin, and propylene carbonate, wherein the glycerin and propylene carbonate are present in a glycerin to propylene carbonate ratio by weight of at least 1:3 and the concentration by weight of ethanol is at least about 16%. Methods of removing nail polish and moisturizing the hands are also provided.
Abstract:
Provided are nail compositions comprising at least one photo-curable polymer dispersed in water (latex), at least one acrylic non-photo-curable polymer dispersed in water (latex), at least one photo-initiator, optionally at least one plasticizer, optionally a colorant, and water. Also provided are nail composition systems and kits comprising the nail compositions of the invention together with a base coat composition and/or a top coat composition.
Abstract:
The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.
Abstract:
The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.
Abstract:
The present invention relates to a nail care system containing (1) at least one composition containing at least one adhesive agent, at least one primary film former and at least one plasticizer; and (2) an applicator.
Abstract:
A nail compositions comprising at least one photo-curable polymer dispersed in water (latex), at least one non-photo-curable polymer dispersed in water (latex), at least one photo-initiator, optionally at least one plasticizer, optionally a colorant, and water are provided. Also provided are nail composition systems and kits comprising the nail compositions of the invention together with a base coat composition and/or a top coat composition.
Abstract:
The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.
Abstract:
A nail compositions comprising at least one photo-curable polymer dispersed in water (latex), at least one polyurethane non-photo-curable polymer dispersed in water (latex), at least one photo-initiator, optionally at least one plasticizer, optionally a colorant, and water are provided. Also provided are nail composition systems and kits comprising the nail compositions of the invention together with a base coat composition and/or a top coat composition.
Abstract:
A false eyelash system includes a false eyelash and an applicator. The false eyelash has an elongate bridge with a plurality of fibers extending laterally therefrom. The bridge has a plurality of slots sized to receive keratinous fibers therethrough. A channel extends axially through the bridge is sized and configured to receive an elongate placement element of an applicator.