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公开(公告)号:US20230082557A1
公开(公告)日:2023-03-16
申请号:US17791834
申请日:2021-01-15
发明人: Christopher WALL , Cong-Que DINH , Seiji NAGAHARA
IPC分类号: G03F7/039 , C07D335/16 , C07D495/10 , C07D519/00 , G03F7/038
摘要: Latent photoinitiator compounds are described, as well as compositions containing such compounds and their uses in photoinitiated methods for producing photoresist structured.