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公开(公告)号:US20070123497A1
公开(公告)日:2007-05-31
申请号:US11440032
申请日:2006-05-25
申请人: Lalitha Krishnan , Subodh Deshmukh , Anthony Hadfield , W. Huang , Mannching Ku
发明人: Lalitha Krishnan , Subodh Deshmukh , Anthony Hadfield , W. Huang , Mannching Ku
IPC分类号: A61K31/65 , C07C237/26
CPC分类号: C07C237/26 , A61N5/10 , C07B2200/13 , C07C2603/46
摘要: Crystalline solid forms of tigecycline, Form I, Form II, Form III, Form IV, and Form V, compositions comprising these crystalline solid forms, and processes for preparing these crystalline solid forms are described herein.
摘要翻译: 形式I,形式II,形式III,形式IV和形式V的替加环素的结晶固体形式,包含这些结晶固体形式的组合物,以及制备这些结晶固体形式的方法在本文中描述。
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公开(公告)号:US20070151949A1
公开(公告)日:2007-07-05
申请号:US11326267
申请日:2006-01-04
申请人: Shiu-Ko Jian , Morning Wu , W. Huang , C. Sun
发明人: Shiu-Ko Jian , Morning Wu , W. Huang , C. Sun
IPC分类号: B44C1/22 , C23F1/00 , H01L21/306 , H01L21/302
CPC分类号: H01L21/31111 , H01L21/02079
摘要: Methods of semiconductor processing and apparatuses are disclosed. An organic solvent is applied over a surface of a material layer on a substrate in which the material layer includes a short-chain structure. A fluorine-containing solution is applied over the surface of the material layer to substantially remove the material layer from the substrate. The apparatus comprises the wafer holder coupled to the organic solvent source and the fluorine solution source. The wafer holder accommodates at least one wafer. The organic solvent source supplies an organic solvent with a temperature from about 18° C. to about 40° C., a concentration from about 90 w. % to about 100 w. % and is applied over the substrate about 100 seconds or more. The fluorine solution source containing fluorine solution supplies the fluorine-containing solution with a temperature from about 18° C. to about 70° C. and a concentration from about 1 w. % to about 49 w. %.
摘要翻译: 公开了半导体处理方法和装置。 将有机溶剂施加在基材上的材料层的表面上,其中材料层包括短链结构。 将含氟溶液施加在材料层的表面上,以从衬底基本上去除材料层。 该装置包括与有机溶剂源和氟溶液源耦合的晶片保持器。 晶片架容纳至少一个晶片。 有机溶剂源提供温度为约18℃至约40℃,浓度为约90w的有机溶剂。 %至约100w。 %,并施加在基材上约100秒以上。 含有氟溶液的氟溶液源将含氟溶液的温度从约18℃至约70℃提供,浓度约为1w。 %至约49 w。 %。
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公开(公告)号:US20070149552A1
公开(公告)日:2007-06-28
申请号:US11639642
申请日:2006-12-15
IPC分类号: A61K31/519
CPC分类号: A61K31/519 , A61K9/0019 , A61K9/19
摘要: The present invention relates to lyophilized compositions of a triazolopyrimidine compound, or a hydrate thereof, or a pharmaceutically acceptable salt of Compound I or hydrate thereof; solutions useful in preparing said lyophilized compositions; methods for preparing such compositions; methods of reconstituting the same; kits containing such compositions; and uses of the compositions for the treatment of cancer.
摘要翻译: 本发明涉及三唑并嘧啶化合物或其水合物或化合物I或其水合物的药学上可接受的盐的冻干组合物; 用于制备所述冻干组合物的溶液; 制备这种组合物的方法; 重组方法; 含有此类组合物的试剂盒; 以及该组合物用于治疗癌症的用途。
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