Microwave plasma applicator with improved power uniformity

    公开(公告)号:US09653266B2

    公开(公告)日:2017-05-16

    申请号:US14645837

    申请日:2015-03-12

    Abstract: An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube.

    MICROWAVE PLASMA APPLICATOR WITH IMPROVED POWER UNIFORMITY

    公开(公告)号:US20150318148A1

    公开(公告)日:2015-11-05

    申请号:US14645837

    申请日:2015-03-12

    Abstract: An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube.

    MICROWAVE PLASMA APPLICATOR WITH IMPROVED POWER UNIFORMITY
    3.
    发明申请
    MICROWAVE PLASMA APPLICATOR WITH IMPROVED POWER UNIFORMITY 审中-公开
    具有改进功率均匀性的MICROWAVE等离子体应用器

    公开(公告)号:US20150279626A1

    公开(公告)日:2015-10-01

    申请号:US14226994

    申请日:2014-03-27

    Abstract: An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube.

    Abstract translation: 用于产生等离子体的装置包括等离子体放电管和螺旋缠绕在等离子体放电管的外表面上的导电线圈。 波导耦合到围绕等离子体放电管的微波腔,以将微波能量引导到等离子体放电管中,使得等离子体在等离子体放电管中产生。 波导被定位成使得微波能量的电场相对于等离子体放电管的纵向轴线定向成预定角度。 导电线圈中产生的感应电流影响等离子体放电管中的功率吸收,该预定角度是可选择的,使得等离子体放电管中的功率吸收相对于等离子体放电管的纵向轴线具有预定的轮廓。

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