公开(公告)号：US20180304660A1

公开(公告)日：2018-10-25

申请号：US15767937

申请日：2016-10-17

Applicant: National Institute of Advanced Industrial Science and Technology

Inventor： Ryohei HOKARI ,  Kazuma KURIHARA ,  Naoki TAKADA

IPC: B41M1/26 ,  B41M5/52 ,  B32B27/28

CPC classification number: B41M1/26 ,  B29C59/02 ,  B32B27/28 ,  B32B2398/20 ,  B41M1/12 ,  B41M1/30 ,  B41M5/52

Abstract: In the present invention, an uneven structure is formed on a surface of a base material to be printed to which ink is applied, and the pitch, the shape in plan view, and the depth of recesses in the uneven structure are determined on the basis of the physical properties (specific weight, viscosity, and contact angle) of ink to be used, in accordance with a printing pattern and a required printing precision. The amount of ink filling the recesses is thereby controlled, and high-precision is enabled at low cost without changing the printing process itself.

公开(公告)号：US20210162788A1

公开(公告)日：2021-06-03

申请号：US17118493

申请日：2020-12-10

Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

Inventor： Ryohei HOKARI ,  Kazuma KURIHARA ,  Naoki TAKADA

IPC: B41M1/26 ,  B29C59/02 ,  G03F7/00 ,  B41M5/52 ,  B32B27/28

Abstract: A method for manufacturing an optical element comprising a fine pattern over a substrate. Further, the method comprises: preparing the substrate comprising an uneven structure on a surface of the substrate, the uneven structure comprising recesses for the fine pattern; applying functional ink to the recesses; obtaining the optical element comprising the fine pattern made from the functional ink in the recesses.