公开(公告)号：US20210191261A1

公开(公告)日：2021-06-24

申请号：US17131094

申请日：2020-12-22

Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

Inventor： Kiwamu SUE ,  Sho KATAOKA ,  Yusuke YOSHIGOE ,  Takatoshi INARI ,  Masatoshi ARAI ,  Takaya MAEHASHI ,  Yoshitaka KOMURO ,  Daisuke KAWANA

IPC: G03F7/004 ,  C07F7/00

Abstract: Organically modified metal oxide nanoparticles containing two or more cores including a plurality of metal atoms and a plurality of oxygen atoms covalently bonded to the plurality of metal atoms; a first modifying group that is a ligand coordinated to each of the cores and selected from the group consisting of a carboxylic acid carboxylate, a sulfonic acid sulfonate, and a phosphonic acid phosphonate; and a second modifying group that is coordinated to each of the cores and is a ligand having a structure different from that of the first modifying group and/or an inorganic anion, in which organically modified metal oxide nanoparticles have a structure in which the cores are crosslinked through a coordinate bond by at least the first modifying group.

公开(公告)号：US20220171286A1

公开(公告)日：2022-06-02

申请号：US17454891

申请日：2021-11-15

Applicant: Tokyo Ohka Kogyo Co., Ltd. ,  National Institute of Advanced Industrial Science and Technology

Inventor： Takatoshi INARI ,  Masatoshi ARAI ,  Takaya MAEHASHI ,  Yoshitaka KOMURO ,  Daisuke KAWANA ,  Kiwamu SUE ,  Sho KATAOKA

IPC: G03F7/039 ,  G03F7/038 ,  C08F220/28

Abstract: A resist composition containing a metal compound and a polymer. A structure of the metal compound is changed upon exposure, and the metal compound exhibits changed solubility in a developing solution. The polymer segregates on a surface of a resist film in a case where the resist film is formed using the resist composition. The metal compound contains a metal ion of a metal atom of Group 3 to Group 16 in the long periodic table or a metal oxide of the metal atom, and a bonder that is bonded to the metal ion or the metal oxide. The content of the metal atom contained in the metal ion or the metal oxide is in a range of 0.2% to 3% by mass with respect to a total mass of the resist composition.