Position detecting method and unit, optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method
    1.
    发明申请
    Position detecting method and unit, optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method 失效
    位置检测方法和单元,光学特性测量方法和单元,曝光装置和装置制造方法

    公开(公告)号:US20020118349A1

    公开(公告)日:2002-08-29

    申请号:US10025917

    申请日:2001-12-26

    CPC classification number: G03F7/706 G06T7/73

    Abstract: Correlation values between a plurality of templates prepared beforehand and a picture-element data distribution as a pick-up result of an image are calculated, and the position of a maximum template whose correlation value is the maximum of the calculated correlation values is obtained. Subsequently, a curved surface function is calculated which fits the distribution of calculated correlation-values in positions near the maximum template's position, and the position of the picked-up image is calculated based on the curved surface function. As a result, the number of templates prepared beforehand to achieve desired accuracy in detecting a position and the number of times of calculating correlation-values can be reduced, and the image position can be quickly and accurately detected.

    Abstract translation: 计算预先准备的多个模板与作为图像的拾取结果的图像元素数据分布之间的相关值,并获得相关值为所计算的相关值的最大值的最大模板的位置。 随后,计算出适合于最大模板位置附近的计算的相关值的分布的曲面函数,并且基于曲面函数来计算拍摄图像的位置。 结果,可以减少预先准备的用于实现检测位置的精确度和计算相关值的次数的模板的数量,并且可以快速和准确地检测图像位置。

    Wavefront aberration measuring method and unit, exposure apparatus, device manufacturing method, and device
    2.
    发明申请
    Wavefront aberration measuring method and unit, exposure apparatus, device manufacturing method, and device 审中-公开
    波前像差测量方法和单元,曝光装置,装置制造方法和装置

    公开(公告)号:US20020159048A1

    公开(公告)日:2002-10-31

    申请号:US10080537

    申请日:2002-02-25

    CPC classification number: G03F7/706 G01J9/00

    Abstract: First, the wave-front aberration in an optical system PL subject to measurement is measured using a measuring system 70 according to a usual method. After that, by using calculated correction information for aberration components of a second set of order terms based on a model for the measuring system 70 and aberration components of a first set of order terms measured before, the result of measuring aberration components of the second set of order terms is corrected. As a result, aberration components of the second set of order terms can be accurately obtained, so that the wave-front aberration in the optical system subject to measurement is accurately obtained.

    Abstract translation: 首先,根据通常的方法,使用测量系统70测量待测量的光学系统PL中的波前像差。 之后,通过使用基于测量系统70的模型和之前测量的第一组次序项的像差分量的第二组次序项的像差分量的计算校正信息,测量第二组的像差分量的结果 订单条款得到纠正。 结果,可以精确地获得第二组次序的像差分量,从而准确地获得受测量的光学系统中的波前像差。

Patent Agency Ranking