WAVE FRONT SENSOR BASED ON FOURIER FILTERING

    公开(公告)号:US20240192060A1

    公开(公告)日:2024-06-13

    申请号:US18552331

    申请日:2022-03-25

    IPC分类号: G01J9/00

    CPC分类号: G01J9/00

    摘要: Systems, devices and methods with improved wave front sensing and detection capabilities are described. One example wave front sensor includes a lenslet array that receives an incoming wave front, and a mask that is positioned at a focal plane of the lenslet array to receive and filter a Fourier transformed wave front that is produced by the first lenslet array at the focal plane. Each section of the mask receives light from a corresponding lens of the lenslet array and is configured to produce a reference wave front and to allow a portion of the Fourier transformed wave front to be transmitted or reflected. The wave front sensor also includes a sensor array having a plurality of light sensitive detectors that is positioned to receive the two wave fronts and to detect an intensity value representative of a phase of the incoming wave front.

    SYSTEM AND METHOD FOR DIGITAL OPTICAL ABERRATION CORRECTION AND SPECTRAL IMAGING

    公开(公告)号:US20230177655A1

    公开(公告)日:2023-06-08

    申请号:US17924271

    申请日:2021-05-12

    IPC分类号: G06T5/00 G01J9/00 G06T7/00

    摘要: There are provided systems and methods for digital optical aberration correction and spectral imaging. An optical system may comprise an optical imaging unit, to form an optical image near an image plane of the optical system; a wavefront imaging sensor unit located near the image plane, to provide raw digital data on an optical field and image output near the image plane; and a control unit for processing the raw digital data and the image output to provide deblurred image output, wherein the control unit comprises a storage unit that stores instructions and a processing unit to execute the instructions to receive the image input and the raw digital data of the optical field impinging on the wavefront imaging sensor and generate a deblurred image based on an analysis of the optical mutual coherence function at the imaging plane.

    ENHANCED PIXEL FOR WAVEFRONT SENSING

    公开(公告)号:US20170208265A1

    公开(公告)日:2017-07-20

    申请号:US14997159

    申请日:2016-01-15

    CPC分类号: G01J9/00 G02B26/06

    摘要: A wavefront sensing pixel is provided. The wavefront sensing pixel includes a low-pass filter filtering a charge signal from a photodetector and outputting a control signal when low-frequency signals are detected in the charge signal, and a control device to control flow of the charge signal past the control device based on whether a low-frequency signal is detected in the charge signal. The wavefront sensing pixel further includes a low-frequency signal path that receives a flow of signals that flow past the control device, and a high-frequency signal path independent of the low-pass filter and the control device, the high-frequency signal path receiving high-frequency signals included in the charge signal.

    OPTICAL WAVEFRONT MEASURING DEVICE AND METHOD

    公开(公告)号:US20170146427A1

    公开(公告)日:2017-05-25

    申请号:US15298842

    申请日:2016-10-20

    发明人: Jen Sheng LIANG

    IPC分类号: G01M11/02 G02B27/30

    摘要: In an optical wavefront measuring device, a SLM generates a plurality of different through holes, so that light beams pass through the through holes and form a plurality of light patterns. The distance between an infinite objective lens module and a test lens is adjusted so that the light patterns enter into a wavefront sensor in the form of approximately parallel light after passing through the infinite objective lens module and the test lens. The wavefront sensor captures a plurality of WS images which do not have a fold-over phenomenon according to the light patterns. Computer by using an algorithm to obtain wavefront change information, and then reconstructs a wavefront on the basis of the wavefront change information.

    METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS
    9.
    发明申请
    METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS 审中-公开
    倾斜设备设计的计量目标设计

    公开(公告)号:US20170023358A1

    公开(公告)日:2017-01-26

    申请号:US15287388

    申请日:2016-10-06

    IPC分类号: G01B11/27 G01J9/00 G03F7/20

    摘要: Metrology methods, modules and targets are provided, for measuring tilted device designs. The methods analyze and optimize target design with respect to the relation of the Zernike sensitivity of pattern placement errors (PPEs) between target candidates and device designs. Monte Carlo methods may be applied to enhance the robustness of the selected target candidates to variation in lens aberration and/or in device designs. Moreover, considerations are provided for modifying target parameters judiciously with respect to the Zernike sensitivities to improve metrology measurement quality and reduce inaccuracies.

    摘要翻译: 提供了测量方法,模块和目标,用于测量倾斜的设备设计。 该方法针对目标候选者和设备设计之间的图案布局错误(PPEs)的泽尔尼克敏感度的关系,分析和优化目标设计。 可以应用蒙特卡洛方法来增强所选择的目标候选者对透镜像差和/或装置设计中的变化的鲁棒性。 此外,还提供了考虑到明确地修改Zernike敏感度的目标参数,以提高计量测量质量并减少不准确度。