摘要:
An OCR process is executed for image data read by an image reading unit. First date information in the image data is acquired based on the OCR process result. Current second date information is acquired. The acquired first date information is compared with the second date information. Time stamp information is added to the image data if the comparison result indicates that the difference between the two pieces of date information falls within a predetermined period. The image data is saved at a designated saving destination.
摘要:
An OCR process is executed for image data read by an image reading unit. First date information in the image data is acquired based on the OCR process result. Current second date information is acquired. The acquired first date information is compared with the second date information. Time stamp information is added to the image data if the comparison result indicates that the difference between the two pieces of date information falls within a predetermined period. The image data is saved at a designated saving destination.
摘要:
An image processing apparatus includes a first authentication unit configured to authenticate a user, a second authentication unit configured to authenticate the user, an operation unit configured to receive an operation from the user, a logout unit configured to set the user in a logout state in which the user is unauthenticated, if a predetermined time has passed without the operation unit receiving any operation from the user while the user is authenticated by the first authentication unit or the second authentication unit, and a change unit configured to change the predetermined time to a second time shorter than a first time, if the user is unauthenticated by the second authentication unit while the user is authenticated by the first authentication unit and the second authentication unit.
摘要:
A device function to be used by an application is specified, a risk level of the specified device function is acquired, and a risk level of the application is calculated based on the acquired risk level of the device function.
摘要:
The present invention provides a producing method of powder particles having an average particle diameter on the order of submicrons. Specifically, the producing method is a producing method of powder particles obtained by grinding a product to be ground by using plural grinding media, wherein the grinding media including at least one kind (grinding medium A) having an average particle diameter of 0.01 to 5 times and at least one kind (grinding medium B) having an average particle diameter of 10 to 450 times, with respect to the average particle diameter of the product to be ground before being ground, are used.
摘要:
In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having a shape factor SF1, which indicates the roundness of a circle and is represented by the following formula: SF 1 = π a 2 4 A × 100 (wherein a represents the length of major axis of each cell, and A represents the area thereof), of 150 or less account for 80% or more of all cells in the first observation region, and, when cells in a second observation region of a second cross section orthogonal to the first cross section are observed at a certain magnification, cells having a shape factor SF1, which indicates the roundness of a circle and is represented by the same formula (wherein a represents the length of major axis of each cell, and A represents the area thereof), of 150 or less account for 80% or more of all cells in the second observation region.
摘要:
In order that a top surface of a gate electrode does not have sharp portions, ends of the top surface of the gate electrode are rounded before refractory metal is deposited for silicidation. This reduces intensive application of film stresses which are generated in heat treatment, enabling formation of a silicide layer with a uniform, sufficient thickness.
摘要:
In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having an aspect ratio a/b, wherein a represents the maximum diameter of each cell and b represents the length of the minor axis of that cell as measured in a direction orthogonal thereto, of 1.3 or less account for 70% or more of all cells in the first observation region, and, when cells in a second observation region of a second cross section orthogonal to the first cross section are observed at a certain magnification, cells having an aspect ratio a/b, wherein a represents the maximum diameter of each cell and b represents the length of the minor axis of that cell as measured in a direction orthogonal thereto, of 1.3 or less account for 70% or more of all cells in the second observation region.
摘要:
In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having a shape factor SF2, which indicates the remoteness from complete roundness and is represented by the following formula: SF 2 = P 2 4 π A × 100 (wherein A represents the area of each cell, and P represents the perimeter length thereof), of 130 or less account for 80% or more of all cells in the first observation region, and, when cells in a second observation region of a second cross section orthogonal to the first cross section are observed at a certain magnification, cells having a shape factor SF2, which indicates the remoteness from complete roundness and is represented by the same formula (wherein A represents the area of each cell, and P represents the perimeter length thereof), of 130 or less account for 80% or more of all cells in the second observation region.
摘要翻译:在本发明的弹性体多孔材料中,当以一定的倍率观察第一截面的第一观察区域的细胞时,具有形状因子SF2的细胞,其表示从完全圆度偏离并由下式表示: SF÷2 = P 2 4&pgr A×100(其中A表示每个细胞的面积,P表示其周长)为130以下,占第一观察区域的全部细胞的80%以上,并且当第二观察区域中的细胞 在一定的放大倍数下观察与第一截面正交的第二截面的观察区域,具有形状因子SF2的单元,其表示从完全圆度偏离并由相同的式(其中A表示每个单元的面积 ,P表示其周长)为130以下,占第二观察区域的全部细胞的80%以上。
摘要:
In order that a top surface of a gate electrode does not have sharp portions, ends of the top surface of the gate electrode are rounded before refractory metal is deposited for silicidation. This reduces intensive application of film stresses which are generated in heat treatment, enabling formation of a silicide layer with a uniform, sufficient thickness.