Patent search ap:("OSAKA UNIVERSITY") AND inv:"Mika Hirose" Page 1

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发明授权
Method for producing substance with modified carbon allotrope surface, method for producing substance with carbon allotrope surface into which functional group is introduced, method for producing grid for cryo-electron microscopy, organic substance, and grid for cryo-electron microscopy 有权

公开(公告)号：US12139406B2

公开(公告)日：2024-11-12

申请号：US17441971

申请日：2020-03-27

Applicant: OSAKA UNIVERSITY

Inventor： Tsuyoshi Inoue , Haruyasu Asahara , Kei Ohkubo , Kenji Iwasaki , Naoyuki Miyazaki , Mika Hirose , Atsushi Nakagawa , Junichi Takagi , Takefumi Doi , Hiroaki Adachi

IPC: C01B32/156 , C01B32/05 , C01B32/168 , C01B32/194 , H01J37/20

Abstract: The present invention provides a method for producing a substance with a modified carbon allotrope surface that can suppress or prevent uneven distribution, uneven orientation, and the like of a structural analysis target substance in a structural analysis by cryo-electron microscopy. A method for producing a substance with a modified carbon allotrope surface of the present invention includes: the step of surface-treating by reacting a carbon allotrope surface with a halogen oxide radical, wherein the carbon allotrope surface is modified by the surface-treating.

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