公开(公告)号：US11429065B2

公开(公告)日：2022-08-30

申请号：US16202284

申请日：2018-11-28

Applicant: ROLEX SA

Inventor： Richard Bossart ,  Nima Merk

IPC: G04B19/04 ,  G04B15/14 ,  G04B13/02 ,  G04B17/06

Abstract: A method of manufacturing a clock or watch component (19; 29) includes (i) providing (E11; E21) a wafer (11; 21) having a single slice (12; 22) including a material of the component, notably silicon, diamond, quartz, sapphire or ceramic, optionally first coating the lower surface of the slice (22) with a lower layer (24), (iii) etching (E12 to E14; E22 to E24) the slice (12; 22) starting from its upper surface to form at least one clock or watch component, (iv) revealing (E15; E25) at least one clock or watch component (19; 29), by removing a layer that served as a mask for etching (E15; E25) and (y) optionally releasing (E26) the slice and the at least one etched clock or watch component by removing the lower layer (24).

公开(公告)号：US20190171164A1

公开(公告)日：2019-06-06

申请号：US16202284

申请日：2018-11-28

Applicant: ROLEX SA

Inventor： Richard Bossart ,  Nima Merk

IPC: G04B19/04

Abstract: A method of manufacturing a clock or watch component (19; 29) includes (i) providing (Ell; E21) a wafer (11; 21) having a single slice (12; 22) including a material of the component, notably silicon, diamond, quartz, sapphire or ceramic, optionally first coating the lower surface of the slice (22) with a lower layer (24), (iii) etching (E12 to E14; E22 to E24) the slice (12; 22) starting from its upper surface to form at least one clock or watch component, (iv) revealing (E15; E25) at least one clock or watch component (19; 29), by removing a layer that served as a mask for etching (E15; E25) and (y) optionally releasing (E26) the slice and the at least one etched clock or watch component by removing the lower layer (24).