Abstract:
An electronic device includes a support having greater than 80% transmittance to light at 550 nm; and a transparent conductor area provided over at least a portion of one side of the support. The transparent conductor area includes: first metallic micro-wires provided in a first pattern, the first conductive micro-wires having a first height and a width in a range from 0.5 um to 20 um; second metallic micro-wires provided in a second pattern having a second height that is greater than the first height and a width in a range from 0.5 um to 20. The metallic micro-wires occupy an area less than 15% of the transparent conductor area.
Abstract:
A touch-responsive capacitive apparatus includes a transparent substrate having electrically connected first pad micro-wires and electrically connected first interstitial micro-wires formed in a first micro-wire layer. The first pad micro-wires are electrically connected to the first interstitial wires. Electrically connected second pad micro-wires and electrically connected second interstitial micro-wires are formed in a second micro-wire layer. The second pad micro-wires are electrically connected to the second interstitial wires. The first or second micro-wire layers are supported by the transparent substrate and pairs of first and second pad areas define corresponding touch-responsive capacitors. A first interstitial micro-pattern is dissimilar from a first pad micro-pattern or a second interstitial micro-pattern is dissimilar from a second pad micro-pattern.
Abstract:
A touch-responsive capacitive apparatus includes a transparent substrate having first and second pad and interstitial areas. Pairs of first and second pad areas define corresponding touch-responsive capacitors. Electrically connected first pad micro-wires are formed in the first pad areas and electrically connected first interstitial micro-wires are formed in the first interstitial areas. The first pad micro-wires are electrically connected to the first interstitial wires. Electrically connected second pad micro-wires are formed in the second pad areas and electrically connected second interstitial micro-wires are formed in the second interstitial areas. The second pad micro-wires are electrically connected to the second interstitial wires. The height of at least a portion of the first interstitial micro-wires is greater than the height of at least a portion of the first pad micro-wires.
Abstract:
A method of making a radiation-sensitive apparatus includes providing a first substrate, forming a radiation-sensitive layer over the first substrate, providing a plurality of spatially separated integrated circuits, each integrated circuit having: a second substrate, one or more electronic circuit(s) formed in or on the second substrate, and one or more electrode connection pads formed in or on the second substrate, each electrode connection pad electrically connected to at least one of the electronic circuit(s). A plurality of pixel electrodes is formed over the first substrate separate from the integrated circuit, each pixel electrode electrically connected to an electrode connection pad. An electronic control circuit is electrically connected to each electronic circuit in each integrated circuit. The electronic circuits are responsive to electrical signals formed by the interaction of electromagnetic radiation and the radiation-sensitive layer, the electrical signals conducted by the pixel electrodes and electrode connection pads.