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公开(公告)号:US20170140068A1
公开(公告)日:2017-05-18
申请号:US15318797
申请日:2015-06-16
Inventor: Hyung-Rai OH , Myoung-Ho KIM , Jun-Su KIM
IPC: G06F17/30
CPC classification number: G06F16/90335 , G06F16/9024 , G06F16/9038
Abstract: A query processing method is disclosed. A query processing method according to an embodiment may comprise the steps of: displaying a first object and a second object; acquiring a user input indicating a relationship between the first object and the second object; displaying a first relationship structure between the first object and the second object on the basis of the user input; and transmitting, to the server, a query including a second relationship structure between at least one first node corresponding to the first object and at least one second node corresponding to the second object, which corresponds to the first relationship structure.
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公开(公告)号:US20130248980A1
公开(公告)日:2013-09-26
申请号:US13775586
申请日:2013-02-25
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Seung-Uk HAN , Jae-Hoon LEE , Jun-Su KIM , Satoru YAMADA , Jin-Seong LEE , Nam-Ho JEON
IPC: H01L27/088
CPC classification number: H01L27/088 , H01L27/108 , H01L27/11
Abstract: According to an example embodiment of inventive concepts, a capacitorless memory device includes a capacitorless memory cell that includes a bit line on a substrate; a read transistor, and a write transistor. The read transistor may include first to third impurity layers stacked in a vertical direction on the bit line. The first and third layers may be a first conductive type, and the second impurity layer may be a second conductive type that differs from the first conductive type. The write transistor may include a source layer, a body layer, and a drain layer stacked in the vertical direction on the substrate, and a gate line that is adjacent to a side surface of the body layer. The gate line may be spaced apart from the side surface of the body layer. The source layer may be adjacent to a side surface of the second impurity layer.
Abstract translation: 根据本发明构思的示例性实施例,一种无电容器存储器件包括:无电容器存储器单元,其在衬底上包括位线; 读取晶体管和写入晶体管。 读取晶体管可以包括在位线上沿垂直方向堆叠的第一至第三杂质层。 第一和第三层可以是第一导电类型,并且第二杂质层可以是不同于第一导电类型的第二导电类型。 写入晶体管可以包括在基板上沿垂直方向堆叠的源极层,主体层和漏极层,以及与主体层的侧表面相邻的栅极线。 栅极线可以与主体层的侧表面间隔开。 源极层可以与第二杂质层的侧表面相邻。
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