公开(公告)号：US20230167586A1

公开(公告)日：2023-06-01

申请号：US18072684

申请日：2022-11-30

Applicant: SLT Technologies, Inc.

Inventor： Mark P. D'EVELYN ,  Keiji FUKUTOMI ,  Drew W. CARDWELL ,  David N. ITALIANO ,  Chiaki DOMOTO

IPC: C30B29/40

CPC classification number: C30B29/406 ,  C30B7/105

Abstract: Embodiments of the present disclosure include techniques related to techniques for processing materials for manufacture of group-III metal nitride and gallium based substrates. More specifically, embodiments of the disclosure include techniques for substrates with a controlled oxygen gradient using a combination of processing techniques. Merely by way of example, the disclosure can be applied to growing crystals of GaN, AlN, InN, InGaN, AlGaN, and AlInGaN, and others for manufacture of bulk or patterned substrates. Such bulk or patterned substrates can be used for a variety of applications including optoelectronic and electronic devices, lasers, light emitting diodes, solar cells, photo electrochemical water splitting and hydrogen generation, photodetectors, integrated circuits, and transistors, and others.