MASK FOR DEPOSITION
    1.
    发明申请

    公开(公告)号:US20250010323A1

    公开(公告)日:2025-01-09

    申请号:US18888910

    申请日:2024-09-18

    Abstract: A deposition mask including a resin film including first holes, a non-resin layer disposed on the resin film and including second holes corresponding to the first holes, and a protective layer disposed on the non-resin layer and including third holes corresponding to the first holes, wherein the protective layer includes a first portion disposed on a top surface of the non-resin layer, and a second portion covering a side surface of the second holes of the non-resin layer.

    MASK FOR DEPOSITION
    2.
    发明申请

    公开(公告)号:US20230036369A1

    公开(公告)日:2023-02-02

    申请号:US17878480

    申请日:2022-08-01

    Abstract: A deposition mask including a resin film including first holes, a non-resin layer disposed on the resin film and including second holes corresponding to the first holes, and a protective layer disposed on the non-resin layer and including third holes corresponding to the first holes, wherein the protective layer includes a first portion disposed on a top surface of the non-resin layer, and a second portion covering a side surface of the second holes of the non-resin layer.

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