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公开(公告)号：US20210028248A1
公开(公告)日：2021-01-28
申请号：US16847208
申请日：2020-04-13
发明人： Inbae KIM , Minho MOON , Kyuhwan HWANG
摘要： A display apparatus includes a substrate including first and display areas, wherein the first display area includes first and second pixel areas and a transmission area; a first pixel disposed in the first pixel area and including a first pixel electrode, a first counter electrode, and a first intermediate layer between the first electrode and the first counter electrode; and a second pixel disposed in the second pixel area and including a second pixel electrode, a second counter electrode, and a second intermediate layer between the second pixel electrode and the second counter electrode. The first and second counter electrodes are disposed in the first and second pixel areas, and the first and the second counter electrodes include a first contact area where the first and the second pixel areas are adjacent to each other. A method of manufacturing the display apparatus is provided.
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公开(公告)号：US20230028524A1
公开(公告)日：2023-01-26
申请号：US17777394
申请日：2020-07-23
发明人： Sungsoon IM , Minho MOON
摘要： A mask includes a mask frame including a first opening part; a first mask disposed on the mask frame and including a second opening part overlapping the first opening part in a plan view; a second mask including a mesh part having a mesh shape overlapping the second opening part in a plan view and disposed on the first mask; and a fixing part disposed on the second mask and extending along an edge of the second mask to surround the mesh part.
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公开(公告)号：US20170029957A1
公开(公告)日：2017-02-02
申请号：US15091913
申请日：2016-04-06
发明人： Youngmin MOON , Sungsoon IM , Minho MOON , Soonchul CHANG
IPC分类号： C23F1/00
CPC分类号： B23K26/384 , B23K26/0093 , B23K26/40 , B23K2103/26 , C23C14/042 , G03F7/004 , H01L21/02063 , H01L21/76804 , H01L51/0011
摘要： A method of manufacturing a mask includes forming a first hole in a base material using a laser, the first hole penetrating through the base material from a first surface to a second surface different than the first surface, and expanding the first hole using an etchant to form a second hole.
摘要翻译： 制造掩模的方法包括：使用激光在基材中形成第一孔，所述第一孔从第一表面贯穿所述基材，与第一表面不同的第二表面，并且使用蚀刻剂使所述第一孔膨胀至 形成第二个洞。
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公开(公告)号：US20200152876A1
公开(公告)日：2020-05-14
申请号：US16563619
申请日：2019-09-06
发明人： In-bae KIM , Minho MOON , Youngho PARK , Sungsoon IM
摘要： Provided is a mask assembly including a mask sheet including a pattern part with at least one opening part, and a welding part connected to the pattern part, and a mask frame with the mask sheet mounted thereon and welded to the welding part. The mask sheet includes a first surface configured to fact the mask frame and a second surface opposite to the first surface. The welding part includes a hatching area in which a surface roughness of the second surface is larger than that of the second surface in the pattern part.
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公开(公告)号：US20170162833A1
公开(公告)日：2017-06-08
申请号：US15196055
申请日：2016-06-29
发明人： Youngmin MOON , Sungsoon IM , Kyuhwan HWANG , Minho MOON
CPC分类号： H01L51/56 , B23K26/382 , B23K2101/36 , C25D1/08 , C25D1/10 , C25D1/20 , C25D3/562 , G03F7/20 , H01L27/3244 , H01L51/0011 , H01L2227/323
摘要： A method of manufacturing a mask assembly includes forming, via an electroforming process, a base material including at least one opening on an electrode plate; and reprocessing the at least one opening using a laser to form at least one reprocessed opening.
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公开(公告)号：US20170141314A1
公开(公告)日：2017-05-18
申请号：US15175640
申请日：2016-06-07
发明人： Youngmin MOON , Minho MOON , Sungsoon IM , Soonchul CHANG , Kyuhwan HWANG
CPC分类号： H01L51/0011 , C23C14/042 , C23C14/24 , H01L27/3244 , H01L51/0023 , H01L51/5237 , H01L51/5256 , H01L51/56
摘要： A mask assembly includes: a mask frame; and a mask sheet disposed on the mask frame, wherein the mask sheet is stretched by applying tensile force and affixed onto the mask frame, wherein the mask sheet includes a pattern including a plurality of openings, and wherein a thickness of the pattern is different from thicknesses of other portions of the mask sheet.
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公开(公告)号：US20210217956A1
公开(公告)日：2021-07-15
申请号：US17014841
申请日：2020-09-08
发明人： SUNGSOON IM , Youngmin MOON , Ji-Hee SON , Minho MOON , SEUNGYONG SONG , DuckJung LEE , Seul LEE
摘要： Provided is a mask which includes a mask body having a plurality of through hole portions and including a polymer film and a plurality of magnetic particles dispersed in the polymer film, and a polymer coating layer disposed on an outer surface of the mask body. Accordingly, the time and cost of manufacturing a mask are reduced and the precision of a deposition process is improved as well, so that the manufacturing yield of a display panel using the mask is improved and a display panel manufactured using the same has improved reliability.
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8.发明申请公开(公告)号：US20180151803A1
公开(公告)日：2018-05-31
申请号：US15677119
申请日：2017-08-15
发明人： Jeongkuk KIM , Minho MOON , Youngmin MOON
CPC分类号： H01L51/0011 , C23C14/042 , H01L21/02642 , H01L27/3244 , H01L51/001 , H01L51/56
摘要： A mask for deposition, a method of manufacturing a mask for deposition, and a method of manufacturing a display device, the mask for deposition being coupleable to a frame with tensile force applied to opposite ends of the mask in a first direction and including a first rib portion having a first thickness; and a pattern portion including a plurality of pattern holes through which a deposition material is transmittable, and at least one etch portion, the at least one etch portion having a second thickness that is less than the first thickness and connecting between some of the plurality of pattern holes.
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公开(公告)号：US20170198383A1
公开(公告)日：2017-07-13
申请号：US15218526
申请日：2016-07-25
发明人： Soonchul CHANG , Seungyong SONG , Sungsoon IM , Kyuhwan HWANG , Minho MOON , Youngmin MOON
摘要： A mask assembly, a method of manufacturing thereof, and an apparatus including the same are provided. The mask assembly includes a mask sheet. The mask sheet includes a pattern portion having openings, and a welding portion connected to the pattern portion. The welding portion has a particle size different from a particle size of the pattern portion.
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10.发明申请DEPOSITION MASK, METHOD OF MANUFACTURING DEPOSITION MASK, AND METHOD OF MANUFACTURING DISPLAY APPARATUS 有权沉积掩模，制造沉积掩模的方法和制造显示装置的方法公开(公告)号：US20160145762A1
公开(公告)日：2016-05-26
申请号：US14947714
申请日：2015-11-20
发明人： Sungsoon IM , Kyu H. HWANG , Jaesik KIM , Minho MOON , Youngmin MOON , Soonchul CHANG , Taewook KANG
CPC分类号： C25D1/10 , B05B12/20 , B05C21/005 , H01L51/0011
摘要： A deposition mask including a mask body including a plurality of pattern holes; a plurality of protrusions protruding from the mask body; and a plurality of grooves formed in the mask body. A grain size of the mask body is in arrange of about 10 μm to about 1000 μm, and a difference between a maximum height of the plurality of protrusions and a maximum height of the plurality of grooves is equal to or less than 0.5 μm.
摘要翻译： 1.一种沉积掩模，包括具有多个图形孔的掩模体; 从所述面罩主体突出的多个突起; 以及形成在面罩主体中的多个凹槽。 掩模体的晶粒尺寸为约10μm至约1000μm，并且多个突起的最大高度与多个凹槽的最大高度之间的差等于或小于0.5μm。
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