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公开(公告)号：US20230024754A1
公开(公告)日：2023-01-26
申请号：US17691074
申请日：2022-03-09
Applicant: Samsung Display Co., LTD.
Inventor： Yong Hwan RYU , Sang Jin PARK , Sa Rah LEE , Sung Bae JU
Abstract: A photolithography apparatus includes a cleaning unit which cleans a target substrate, a drying unit which dries the target substrate provided from the cleaning unit, and a coating unit which forms a photoresist layer by coating a photoresist on the target substrate provided from the drying unit. The drying unit includes a first vacuum unit which performs a vacuum treatment on the target substrate.
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