公开(公告)号：US20130081700A1

公开(公告)日：2013-04-04

申请号：US13688935

申请日：2012-11-29

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-Won HONG ,  Min-Jae JEONG ,  Heung-Yeol NA ,  Eu-Gene KANG ,  Seok-Rak CHANG

IPC: F17D1/02

CPC classification number: F17D1/02 ,  C23C16/4485 ,  C23C16/52 ,  Y10T137/0318

Abstract: Provided are a source gas supply unit capable of supplying a constant amount of source gas to a deposition chamber to deposit a uniform layer, and a deposition apparatus and method using the same. The source gas supply unit includes a canister in which a source is stored, a heater heating the canister, a source gas supply pipe provided on one side of the canister, a measuring unit installed on the source gas supply pipe and measuring an amount of source gas passing through the source gas supply pipe, and a temperature controller connected to the heater and the measuring unit. The temperature controller controls the heater based on the amount of the source gas measured by the measuring unit.

Abstract translation: 提供能够向沉积室供给恒定量的源气体以沉积均匀层的源气体供应单元，以及使用该源气体供应单元的沉积设备和方法。 源气体供给单元包括储存有源的罐，加热罐的加热器，设置在罐的一侧的源气体供给管，安装在源气体供给管上并测量源的量的测量单元 通过原料气体供给管的气体以及连接到加热器和测量单元的温度控制器。 温度控制器基于由测量单元测量的源气体的量来控制加热器。