METHOD OF MANUFACTURING DISPLAY APPARATUS
    2.
    发明申请

    公开(公告)号:US20200335730A1

    公开(公告)日:2020-10-22

    申请号:US16777262

    申请日:2020-01-30

    Abstract: A method of manufacturing a display apparatus includes: preparing a substrate including a display area and a sensor area arranged in the display area; forming first counter electrodes on the substrate so that the first counter electrodes are spaced apart from one another in the sensor area to have a first pattern; depositing second counter electrodes having a second pattern different from the first pattern to be spaced apart from one another in the sensor area; and arranging a component to correspond to the sensor area.

    MASK FRAME ASSEMBLY FOR THIN LAYER DEPOSITION, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING DISPLAY APPARATUS BY USING THE MASK FRAME ASSEMBLY
    3.
    发明申请
    MASK FRAME ASSEMBLY FOR THIN LAYER DEPOSITION, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING DISPLAY APPARATUS BY USING THE MASK FRAME ASSEMBLY 审中-公开
    用于薄层沉积的掩模框架组件,其制造方法以及使用掩模框架组件制造显示装置的方法

    公开(公告)号:US20160322571A1

    公开(公告)日:2016-11-03

    申请号:US14978471

    申请日:2015-12-22

    CPC classification number: H01L51/0011 C23C16/042 H01L51/56

    Abstract: A mask frame assembly through which a deposition material to be deposited on a substrate passes, the mask frame assembly includes a frame including an opening, and a mask having first and second ends in a length direction thereof coupled to the frame, in which the mask includes a main body part having a first thickness and including a pattern part, the pattern part including pattern holes through which the deposition material passes and a support part having a second thickness greater than the first thickness and extending away from first and second ends of the main body part.

    Abstract translation: 掩模框架组件,通过该掩模框架组件沉积在基板上的沉积材料通过,掩模框架组件包括包括开口的框架和具有连接到框架的长度方向上的第一和第二端的掩模,其中掩模 包括具有第一厚度并包括图案部分的主体部分,所述图案部分包括沉积材料通过的图案孔和具有大于第一厚度的第二厚度并且远离第一厚度的第一和第二端延伸的支撑部分 主体部分。

    DEPOSITION APPARATUS
    4.
    发明申请

    公开(公告)号:US20210062322A1

    公开(公告)日:2021-03-04

    申请号:US17010535

    申请日:2020-09-02

    Abstract: A deposition apparatus may include a chamber, a crucible in the chamber, a cover part covering the crucible, and 2n nozzles (where ‘n’ is a positive integer number) protruding from the cover part and arranged in a first direction. Among the 2n nozzles, a distance between a n-th nozzle and a (n+1)-th nozzle may be greater than a distance between a (2n−1)-th nozzle and a 2n-th nozzle.

    MAGNET PLATE ASSEMBLY, DEPOSITION APPARATUS INCLUDING THE SAME, AND METHOD OF DEPOSITION USING THE SAME
    5.
    发明申请
    MAGNET PLATE ASSEMBLY, DEPOSITION APPARATUS INCLUDING THE SAME, AND METHOD OF DEPOSITION USING THE SAME 有权
    磁铁板组件,包括其的沉积装置和使用其的沉积方法

    公开(公告)号:US20160104561A1

    公开(公告)日:2016-04-14

    申请号:US14659684

    申请日:2015-03-17

    CPC classification number: H01F7/021 C23C14/042

    Abstract: Disclosed is a magnet plate assembly that includes a plurality of magnetic bodies, each magnetic body having a first surface formed to correspond to a flat surface of a substrate and to contact the flat surface of the substrate and a second surface formed in a different direction from that of the first surface, and a support frame which supports the plurality of magnetic bodies and has a plurality of grooves in which the plurality of magnetic bodies are respectively seated.

    Abstract translation: 公开了一种磁板组件,其包括多个磁体,每个磁体具有形成为对应于基板的平坦表面并且与基板的平坦表面接触的第一表面和与基板的平坦表面接触的第二表面, 第一表面的支撑框架和支撑多个磁体的支撑框架,并且具有分别安置有多个磁体的多个槽。

    NOZZLE FOR DEPOSITION SOURCE AND THIN FILM DEPOSITING APPARATUS INCLUDING THE NOZZLE
    6.
    发明申请
    NOZZLE FOR DEPOSITION SOURCE AND THIN FILM DEPOSITING APPARATUS INCLUDING THE NOZZLE 审中-公开
    用于沉积源和薄膜沉积装置的喷嘴,包括喷嘴

    公开(公告)号:US20160047041A1

    公开(公告)日:2016-02-18

    申请号:US14665393

    申请日:2015-03-23

    CPC classification number: C23C14/042 C23C14/24 C23C14/243

    Abstract: A deposition source nozzle including a convergence guide configured to guide a deposition source material discharged from the deposition source nozzle to a convergence direction with respect to the deposition source nozzle, and a divergence guide configured to guide the deposition source material discharged from the deposition source nozzle to a divergence direction with respect to the deposition source nozzle, the divergence direction being opposite to the convergence direction with respect to the discharging direction of the deposition source material.

    Abstract translation: 一种沉积源喷嘴,包括会聚引导件,其构造成将从沉积源喷嘴排出的沉积源材料相对于沉积源喷嘴引导到会聚方向;以及发散引导件,其构造成引导从沉积源喷嘴排出的沉积源材料 相对于沉积源喷嘴发散方向,发散方向相对于沉积源材料的排出方向与会聚方向相反。

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