公开(公告)号：US20240242979A1

公开(公告)日：2024-07-18

申请号：US18351754

申请日：2023-07-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyo Shin LIM ,  Ho Jun LEE

IPC: H01L21/67

CPC classification number: H01L21/67046 ,  H01L21/67173 ,  H01L21/67207 ,  H01L21/67248

Abstract: A substrate cleaning apparatus may include a steam injector configured to clean a substrate, a steam supplier configured to supply a steam, and a gas supplier configured to supply a gas. The steam injector may include a drive unit configured to move horizontally, a plate on the drive unit, and a plurality of nozzles on the plate. The plate may include a temperature sensor, a first pressure sensor, and a second pressure sensor. Each of the plurality of nozzles may be connected to the steam supplier and the gas supplier. The plurality of nozzles may be arranged in one direction from a planar viewpoint.