公开(公告)号：US20140111782A1

公开(公告)日：2014-04-24

申请号：US13942854

申请日：2013-07-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin-Hong PARK ,  Jeong-Ho YEO ,  Joo-On PARK ,  Chang-Min PARK

IPC: G03F7/20

CPC classification number: G03F7/70916

Abstract: Provided are a lithography apparatus, a method for lithography and a stage system. The lithography apparatus includes a reticle stage having a reticle, at least one nozzle on at least one surface of the reticle stage and configured to allow shielding gas to flow to a surface of the reticle to form an air curtain, and a gas supply unit configured to supply the nozzle with the shielding gas.

Abstract translation: 提供了一种光刻设备，一种光刻方法和一个舞台系统。 光刻设备包括具有掩模版的标线片台，在标线片台的至少一个表面上的至少一个喷嘴，并且被配置为允许保护气体流到标线片的表面以形成气帘;以及气体供给单元， 以向喷嘴供应保护气体。