HEATER STAGE
    1.
    发明公开
    HEATER STAGE 审中-公开

    公开(公告)号:US20240155740A1

    公开(公告)日:2024-05-09

    申请号:US18383077

    申请日:2023-10-24

    Inventor: Yoshiaki MORIYA

    CPC classification number: H05B3/283 H02N13/00

    Abstract: A heater stage includes an insulating ceramic substrate including lower and upper substrates, each including a first ceramic, and a heat generating element located between the lower substrate and the upper substrate and including a second ceramic and a second metal carbide. The first ceramic of the insulating ceramic substrate and the second ceramic of the heat generating element include at least one of a metal nitride and a metal oxide, a content of the second ceramic in the heat generating element is greater than a content of the second metal carbide in the heat generating element, the heat generating element has a relative density of 95% or more and a volume resistance value of 1.0 Ω·cm or less at room temperature, and a rate of change of the volume resistance value of the heat generating element with an increase in temperature by 100° C. is 0.1 or less.

    APPARATUS FOR MANUFACTURING A SEMICONDUCTOR DEVICE

    公开(公告)号:US20220223384A1

    公开(公告)日:2022-07-14

    申请号:US17570806

    申请日:2022-01-07

    Abstract: An apparatus for manufacturing a semiconductor device may include a vacuum chamber, an electrostatic chuck (ESC), a cooler, an RF plate, a casing, a base plate and a gas supplier. The ESC may be arranged in the vacuum chamber. The cooler may be configured to cool the ESC. The RF plate may be arranged under the cooler. The casing may be configured to support the cooler. The base plate may be opposite to the RF plate to form an inner space together with the casing. The gas supplier may supply a gas having a low dew point to the inner space. Thus, a generation of the dew condensation at the very low temperature may be prevented so that a damage caused by a short, which may be generated by the dew condensation, may also be prevented.

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