公开(公告)号：US10344380B2

公开(公告)日：2019-07-09

申请号：US14176263

申请日：2014-02-10

Applicant: SunEdison, Inc.

Inventor： Arash Abedijaberi ,  Shawn George Thomas

IPC: C23C16/00 ,  C23C16/455 ,  H01L21/00

Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

公开(公告)号：US20140224174A1

公开(公告)日：2014-08-14

申请号：US14176263

申请日：2014-02-10

Applicant: SunEdison, Inc.

Inventor： Arash Abedijaberi ,  Shawn George Thomas

IPC: C23C16/455

CPC classification number: C23C16/45504 ,  C23C16/45563

Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

Abstract translation: 一种用于基板处理系统的衬套组件，包括第一衬垫和第二衬套。 第一衬里包括环形体和包括第一流体引导件的外周表面。 第一流体引导件围绕围绕第一衬垫延伸的周向线弯曲。 第二衬套包括环形体，外缘，内缘，在外缘和内缘之间延伸的第二流体引导件，以及从第二流体引导件向外延伸的多个分隔壁。 当第一和第二衬垫位于处理系统内时，第二流体引导件围绕圆周线弯曲。