公开(公告)号：US11732137B2

公开(公告)日：2023-08-22

申请号：US16768672

申请日：2020-04-08

Applicant: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

Inventor： Lin Al ,  Hsiaohsien Chen

IPC: C09B69/10 ,  C09B47/08 ,  C09B47/18 ,  G02B1/04

CPC classification number: C09B69/108 ,  C09B47/085 ,  C09B47/18 ,  G02B1/04 ,  G02F2202/04 ,  G02F2203/01

Abstract: The present application discloses a color resist material, a filter, and a preparation method thereof. The color resist material is a trimer structure formed by polymerizing phthalocyanine dyes, wherein groups with double bonds are introduced on the phthalocyanine dyes to construct a three-molecule complex by a complexing agent, and the phthalocyanine dyes are connected by the double bonds to form a trimer structure. The color resist material with the trimer structure is stably stored in a photoresist liquid and has excellent solvent resistance, while maintains good solubility. Accordingly, a filter made of the color resist material has high transmittance and good optical performance.