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公开(公告)号:US11434359B2
公开(公告)日:2022-09-06
申请号:US16978260
申请日:2019-03-04
Applicant: TDK CORPORATION
Inventor: Takashi Inagaki , Junpei Hayama
Abstract: A resin composition including: a thermosetting resin component including a mesogen; and a phosphorus atom-containing thermoplastic polymer type frame retardant, wherein the thermoplastic polymer type frame retardant is a phosphorous atom-containing formed by polymerizing or copolymerizing one of monomers represented by general formulae (1) and (2) below, wherein, in the general formulae (1) and (2), each of R1 and R2 is any one of an alkyl group, an alkoxy group, an aryl group and an aryloxy group, R1 and R2 being different or identical, and R3 is a methyl group or a hydrogen atom.
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公开(公告)号:US11605492B2
公开(公告)日:2023-03-14
申请号:US16185448
申请日:2018-11-09
Applicant: TDK CORPORATION
Inventor: Shigeru Kaneko , Toshio Tomonari , Junpei Hayama , Tomohiro Moriki , Noritaka Chiyo
Abstract: Disclosed herein is a coil component that includes a first coil part spirally wound in a plurality of turns, the first coil part including a first turn positioned at an innermost periphery and a second turn positioned on an outer peripheral side relative to the first turn; and a second coil part spirally wound in a plurality of turns, the second coil part including a third turn positioned at an innermost periphery and a fourth turn positioned on an outer peripheral side relative to the third turn. The first turn and the fourth turn are connected to each other, and the second turn and the third turn are connected to each other.
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公开(公告)号:US11854732B2
公开(公告)日:2023-12-26
申请号:US16668700
申请日:2019-10-30
Applicant: TDK Corporation
Inventor: Junpei Hayama , Noritaka Chiyo , Shigeru Kaneko , Tomohiro Moriki , Takahiro Ohishi , Toshio Tomonari
CPC classification number: H01F27/2804 , H01F27/06 , H01F41/041 , H01F2027/2809
Abstract: Disclosed herein is an apparatus that includes a substrate having first and second surfaces opposite to each other, a first coil pattern formed on the first surface of the substrate, and a second coil pattern formed on the second surface of the substrate. The first coil pattern includes first and second lines, and the second coil pattern includes third and fourth lines. The first line is greater in a number of turn than the second line, and the third line is greater in a number of turn than the fourth line. The first line is connected to the fourth line, and the third line is connected to the second line.
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公开(公告)号:US11804654B2
公开(公告)日:2023-10-31
申请号:US17403575
申请日:2021-08-16
Applicant: TDK Corporation
Inventor: Masaki Matsushima , Makoto Orikasa , Ryota Uchiyama , Junpei Hayama
Abstract: Disclosed herein is a coil component that includes a substrate, a coil pattern formed on one surface of the substrate, and a magnetic layer comprising a composite material obtained by dispersing magnetic particles in resin and formed on the one surface of the substrate so as to cover the coil pattern. The coil pattern has a flat shape in which a thickness thereof is smaller than a radial width. Each of the magnetic particles has a flat shape in which a thickness thereof in a direction perpendicular to the one surface of the substrate is smaller than a diameter in a direction parallel to the one surface of the substrate. Some of the magnetic particles exist within a height range of the coil pattern with respect to the one surface of the substrate.
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公开(公告)号:US11715976B2
公开(公告)日:2023-08-01
申请号:US16802372
申请日:2020-02-26
Applicant: TDK Corporation
Inventor: Noritaka Chiyo , Toshio Tomonari , Shigeru Kaneko , Shigenori Hirata , Akihito Watanabe , Hirohumi Asou , Junpei Hayama , Shigeki Ohtsuka , Takahiro Ohishi , Takaaki Imai , Tomohiro Moriki , Takakazu Maruyama
CPC classification number: H02J50/10 , H01F5/04 , H01F27/2828 , H04B5/0037 , H04B5/0081
Abstract: Disclosed herein is a coil component that includes a first coil pattern wound in a planar spiral shape. At least one turn constituting the first coil pattern is divided into a plurality of lines by a spiral slit, and a space width between the plurality of lines differs depending on a planar position.
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公开(公告)号:US11505694B2
公开(公告)日:2022-11-22
申请号:US16978260
申请日:2019-03-04
Applicant: TDK CORPORATION
Inventor: Takashi Inagaki , Junpei Hayama
Abstract: A resin composition including: a thermosetting resin component including a mesogen; and a phosphorus atom-containing thermoplastic polymer type frame retardant, wherein the thermoplastic polymer type frame retardant is a phosphorous atom-containing formed by polymerizing or copolymerizing one of monomers represented by general formulae (1) and (2) below, wherein, in the general formulae (1) and (2), each of R1 and R2 is any one of an alkyl group, an alkoxy group, an aryl group and an aryloxy group, R1 and R2 being different or identical, and R3 is a methyl group or a hydrogen atom.
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