公开(公告)号：US20220100082A1

公开(公告)日：2022-03-31

申请号：US17546227

申请日：2021-12-09

Applicant: TOPPAN INC.

Inventor： Akihito OKUMURA ,  Hiroaki MIYAJI ,  Takehiro YAMADA

IPC: G03F1/70 ,  G03F7/20 ,  G03F1/00 ,  G02F1/1335 ,  G03F1/76 ,  G03F7/00

Abstract: A photomask is used for scanning type projection exposure provided with a projection lens assembly composed of a lens assembly. A line width in a plurality of patterns of the photomask in a region to be transferred by performing scanning exposure including connecting portions of the lens assembly are corrected with respect to a line width of patterns which are the same as the patterns of the photomask present in a region to be transferred by performing scanning exposure but do not include the connecting portions.