公开(公告)号：US12269241B2

公开(公告)日：2025-04-08

申请号：US17973694

申请日：2022-10-26

Applicant: TOPPAN INC.

Inventor： Miki Fukugami ,  Kaoru Furuta

IPC: B32B27/08 ,  B32B1/08 ,  B32B27/32 ,  B65D65/40

Abstract: A gas barrier film including: a substrate layer containing polypropylene; a resin layer containing a copolymer of propylene and another monomer; a vapor deposition layer of an inorganic oxide; and a gas barrier layer, laminated in this order, wherein the vapor deposition layer has a thickness of 5 nm to 300 nm, the resin layer has a thickness of 0.3 μm or more, and a surface of the resin layer facing the vapor deposition layer has at least one softening temperature in a range of 100° C. to 170° C. when measured by local thermal analysis (LTA).