Gas barrier film
    1.
    发明授权

    公开(公告)号:US12269241B2

    公开(公告)日:2025-04-08

    申请号:US17973694

    申请日:2022-10-26

    Applicant: TOPPAN INC.

    Abstract: A gas barrier film including: a substrate layer containing polypropylene; a resin layer containing a copolymer of propylene and another monomer; a vapor deposition layer of an inorganic oxide; and a gas barrier layer, laminated in this order, wherein the vapor deposition layer has a thickness of 5 nm to 300 nm, the resin layer has a thickness of 0.3 μm or more, and a surface of the resin layer facing the vapor deposition layer has at least one softening temperature in a range of 100° C. to 170° C. when measured by local thermal analysis (LTA).

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